Used VARIAN E220HP #9237131 for sale
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ID: 9237131
Wafer Size: 8"
Vintage: 1994
Ion implanter, 8"
Terminal module / Gas cabinet:
Gas cylinder volume: 4 ltrs
No Ar (External / Internal)
AsH3 Cylinder type: High pressure
PH3 Cylinder type: SDS 2.25L
BF3 Cylinder type: High pressure 1L
Gas line purge
No dual vaporizer option
M-Chuck
Terminal module / Source:
Source head type: Bernus
Source bushing type: EHP
No source magnet polarity switch
No 2 steps reducer type option
Terminal module / Beam-line:
Scan generator: 20 kV
Mirror: 30 kV
Automatic graded decel relay & P/S
No hall probe option
Beam energy probe option
End station module:
Wafer handler platform type: Standard
Platen type: M-Clamp
Roplat & tilt type
Travel faraday type: TVL Faraday
No metal contamination reduction kit option
CVCF
Enclosure:
No video viewing of wafer loading
No three light signal tower
Smoke detectors
No water leak detectors
No service monitor
Accessories:
Source turbo pump type: SEIKO STP-1000C
Analyzer turbo pump type: SEIKO STP-300C
Beam-line turbo pump type: SEIKO STP-1000C
Source rough pump type: EBARA 40x20
No beam line booster pump
Stage pump type: EBARA 50x20
L/L Pump type: EBARA A30W
Target cryo pump type: CTI-250
Load lock pump type: AISHIN GD263
Cryo compressor type: SUZUKI C300
Remote PD
Option: Beam drift monitor
System PC: 1 GHz
Spare parts:
Ion source head
Terminal insulator
1994 vintage.
VARIAN E220HP endstation is a state-of-the-art ion implanter and monitor. It is an advance equipment designed to provide maximum beam current and energy stability. This versatile workhorse of a system is equipped with cutting-edge technologies to ensure the best results in implanting and monitoring the depth, skew and uniformity of the implant. The unit is powered by an energy-efficient, high-power dual beam accelerator, capable of running in either single or multiple beam mode. This allows for greater flexibility and increased control over the implanting and dose control for every application. The machine is also outfitted with a robust shield assembly designed to reduce radiation emissions from the accelerator. This feature of the tool ensures that the work environment is kept safe and the quality of the implants generated are of the highest quality possible. For monitoring implant profiles, the asset is equipped with a high precision beam tuning model that allows for precise control over beam position and dose distribution. The monitoring equipment can also measure the non-uniformity of the implant. It includes software that can quickly identify regions of non-uniformity and offer solutions to fix the issue. The system also includes a variety of diagnostic tools that can be used to further fine-tune the process and ensure that implants are of the highest quality and reliability. The unit also comes with a user-friendly interface, allowing the operator to effortlessly manage the entire implant process. Its graphical user interface allows for easy navigation and all the necessary settings can be managed with a few clicks. This makes the entire implant process more efficient and reduces the amount of time needed to complete the process. VARIAN E220 HP has also been designed to offer maximum machine uptime and reliability. It has a self-monitoring tool which can detect problems before they become an issue and alert the operator. The machine also features automated maintenance protocols and user defined maintenance routines, which help keep it running efficiently and effectively at all times. E 220 HP is the perfect asset for manufacturers who are looking for high-performance ion implanter and monitor. With its state-of-the-art features, robust shield assembly and user friendly interface, it is sure to provide the highest-possible quality implants in both efficiency and reliability.
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