Used VARIAN E220HP #9259892 for sale
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ID: 9259892
Wafer Size: 8"
Vintage: 1996
Ion implanter, 8"
Gas cabinet:
Gas cylinder volume (liter): 1.0 Liter
Internal Ar
AsH3 Cylinder type: Vaporizer
PH3 Cylinder type: High pressure
BF3 Cylinder type: High pressure
Gas line purge
Vaporizer P.S
Source:
Source head type: Bernas
No reducer type 2 step
Beam line:
Scan generator: 20 kV
Mirror: 30 kV
No automatic graded decel relay and P/S
No hall probe
End station:
Old platform
M-Clamp
Three light signal tower
VESDA Smoke detectors
Service monitor
No control computer CVCF
No video viewing of wafer loading
Accessory:
STP-1000C Source turbo pump
STP-300C Analyzer turbo pump
STP-1000 Beam line turbo pump
QDP80 Source rough pump
QDP40 Stage pump
QMP250/QDP40 End station pump
SUZUKI SHOKAN A250F Target cryo pump
SUZUKI SHOKAN A100L Load lock pump
SUZUKI SHOKAN C300 Cryo compressor
No remote PD
Vaporizer power supply missing
1996 vintage.
VARIAN E220HP is a high precision ion implanter and monitor designed for implantation of precise doses of ions into semiconductor materials. It is a versatile, automated equipment that can be used for a wide range of implantation applications. The system comes equipped with a number of features that maximize efficiency and precision. VARIAN E220 HP consists of an ion source, an accelerator, a beam control unit, and a process chamber. The ion source creates and accelerates the implanted ions to precise energies. The ion source is equipped with vacuum and cryopumping systems, and a temperature controller for optimum implantation performance. The accelerator is designed to provide a high-energy beam of ions to the substrate. It can also be used for tuning the beam energy further downstream before implanting into the substrate. The beam control machine is designed for precise control of the beam angle and intensity. This tool also features an extractor that can precisely adjust the ion extraction and beam angle during implantation. The process chamber is constructed with a stainless steel enclosure, providing excellent protection against contamination and allowing precise control of process conditions. The asset has a highly automated user interface, which allows users to set up complex implantation processes quickly and easily. Parameters like ion elemental composition, ion energy and beam angle are all adjustable directly from the user interface. Furthermore, the model can be integrated with other systems through an external computer. This provides additional flexibility and precision when dealing with multiple implantation processes. E 220 HP is designed for maximum reliability and consistent performance. It is designed to withstand rigorous environmental conditions, such as temperature and humidity variations that occur in industrial applications. This ensures that the equipment will perform without interruption even in harsh working conditions. Additionally, the system is equipped with a number of diagnostic and monitoring systems that can detect and identify unit faults before they occur. E220 HP is an excellent choice for those who require precise implantation of ions into semiconductor materials. Its advanced control and automation systems provide maximum precision and efficiency, enabling users to maximize productivity. Its reliable performance makes it suitable for a wide range of industrial applications.
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