Used VARIAN E31000130 #293671705 for sale

VARIAN E31000130 is a high-performing ion implanter and monitor that provides superior accuracy and reliability for advanced substrate surface treatments. The device combines a dual-beam scanning equipment, advanced control software, and a removable ion source with a high-precision dosimetry system, allowing for reliable and repeatable control of dynamic implant parameters throughout the entire implantation process. E31000130 integrates advanced feedback sensors to measure the position, energy, and amount of implanted ions in order to ensure precise control of parameters for optimal process results. The device has a double beam scanning unit to allow for quick and accurate image acquisition and dose monitoring of the substrate surface treatment. This machine consists of powerful and accurate laser-driven ion optics with adjustable, high-precision scanning angles allowing for accurate control of the beam's direction and dose. The laser's tightly-controlled scanning angle ensures optimal distribution of ions over the substrate's surface for optimal homogeneous dose regulation. Additionally, the double beam scanning tool allows for fast and precise assessment of the substrate's surface area. VARIAN E31000130 allows for complete control of parameters during the ion implantation process. This includes robust control of the ion beam charge, voltage, number of ions per pulse, scan range, dose rate, and beam current, among other parameters. Its ProScan Active process monitoring asset allows users to easily adjust ion implantation cycles with real-time feedback on the status of the beam position, charge, and dose rate. This allows for fast, reliable, and accurate control of implant parameters for ideal results. The model also integrates a series of powerful feedback sensors to measure the position, energy, and amount of implanted ions. By comparing on-site values with on-line databases and values given by the user, the equipment can control all implant parameters to achieve the desired ion density and uniformity. This feedback system also keeps users constantly informed on the dosage and beam position at any given moment. Overall, E31000130 is a reliable and powerful device for precise ion implantation and monitoring applications. The device's dual-beam scanning unit and integrated feedback sensors provide superior accuracy and reliability for substrate surface treatments. Additionally, its adjustable ion beam parameters and active process monitoring machine allow users to precisely control all implant parameters for optimal process results.