Used VARIAN E500 HP #9220342 for sale

VARIAN E500 HP is an ion implanter and monitor equipment designed and produced by VARIAN Semiconductor Equipment Group, Inc. This system is used in the design and manufacturing of integrated circuits. It is a highly reliable, efficient and precise unit for implanting ions into wafers with controlled energy deposition. VARIAN E500HP is a versatile machine that can be used for both low-energy and medium-energy implanting. This tool contains a low-power ion source for ion generation and ion beam analysis. The asset also has several advanced components, such as a graphical user interface, a rapid response beam control model, a high-resolution digital camera, a compact beam monitor and a powerful overhead equipment scanner. The graphical user interface provides direct control of the beam parameters and wafer orientation, as well as multiple layer ion implantation. Ion beams are transformed into current distributions when they enter the system, and this is achieved with the beam control unit. This machine has dynamic control capabilities to ensure accurate and uniform current distribution, while also providing real-time monitoring and control. Additionally, the digital camera helps visualize the beam profile and current distributions in real-time, providing precision implantation. The compact beam monitor provides reliable data collection and monitoring, allowing for improved process monitoring and higher accuracy of uniformity. This tool is also equipped with an overhead wafer scanner for non-stop operation with ultra-high speed scanning and patterning. Also, E-500HP is designed so that it works with a wide range of materials and implantation conditions, making it ideal for a variety of implantation applications. The combination of VARIAN E-500HP's features make it an invaluable tool for the fabrication industry. It provides a consistent, predictable and reproducible result, which is essential for successful and economic production of chips. This asset can also be used for producing different types of materials in the form of layers, as well as for cleaning up particles and contamination. Additionally, the model is also designed to minimize sputter damage, which can cause damage to substrates due to prolonged exposure to high-energy ions. Overall, E500 HP is an advanced and efficient equipment that provides precise implantation and monitoring of ions for various applications. It is designed with innovative features and components to provide superior control and uniformity while also significantly reducing the time and cost of production.