Used VARIAN E500 HP #9239353 for sale

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ID: 9239353
Wafer Size: 6"
Vintage: 1996
Ion implanter, 6" Compressor: 9600 Chamber cryo pump: 250 F L/L Cryo pump 100 Process gas: BF3, PH3, AsH3 Beamline: Dry pump: DPA-943492 Turbo pump: STP-1000C Missing parts Power supply: 208 VAC, 5 Wire, 42.3 kVA, 3 Phase 1996 vintage.
VARIAN E500 HP is a high-performance ion implanter and monitor. It is designed to provide precision and control for ion implanting applications. VARIAN E500HP features a very high voltage variable controller and a digital readout that allows for accurate dose control. E-500HP also offers a large and sturdy base, multiple insulated gas connections, internal gas flow/feed equipment, and an ergonomic design that eliminates any potential sources of contamination. E500HP offers a comprehensive range of features to control and adjust the implant depth and energy range. Its unique variable laser control and digital readout make it one of the most reliable and accurate sources of ion implantation. E-500 HP is highly configurable and comes with a wide range of energy ranges. With a wide range of options, such as dual-energy scanning, boundary detection, dynamic resolution, and atomic mass analysis, VARIAN E 500 HP ensures consistent results. E500 HP can accommodate different gas types, including neutral gas, alkaline gas, and noble gas. It also offers a variety of optional accessories, such as a power supply, source assembly, and annealing ovens. The system is designed to provide accurate and repeatable results. It can also handle samples with different surface areas and can accommodate samples of various sizes. E 500 HP provides easy configuration, and manual and semi-automatic control. Its user interface is intuitive and easy to use, making it ideal for novice users. The unit also features a range of safety features, including spark resistant fixtures and a shutter safety machine. VARIAN E-500 HP offers excellent performance, precision, and control. It is capable of reliably producing high-quality ion implants for a wide range of applications. It is an ideal tool for scientific research and production of consistently high-quality ion implants.
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