Used VARIAN E500 HP #9262461 for sale

VARIAN E500 HP is an ion implanter and monitor with several features that make it an ideal solution for implantation applications. The device uses innovative technology to provide accurate and reliable ion implantation. It features large beam current and large beam size sets, allowing for more uniform implantation. Additionally, VARIAN E500HP provides precision control through its high-precision variable current and magnetic field control which allow for better process control and improved device yield. The beam current can be accurately set up to 20mA, making E-500HP suitable for implantation of materials such as silicon, gallium arsenide, carbon, and germanium. The large beam size sets ensure high-yield uniformity and reduced surface contamination. Additionally, E 500 HP offers a beam blanking system that ensures particle-free implantation. The ion monitor is customizable and provides precise implantation control and continuous process monitoring. VARIAN E-500HP has a range of beam delivery systems to suit a variety of implantation needs. These systems allow for rapid beam positioning and feedback for robust processes. The beam modulation is achieved with a high-speed, variable current capability, allowing for better control and positioning. The device features a curved channel magnet with variable strength that is ideal for improving uniformity and removing contamination of the sample during implantation. E-500 HP also features several safety systems and alarm functions for optimal protection. These safety systems include active monitoring of the process chamber and equipment components and automatically shutting down in the case of a malfunction. Additionally, an arc fault detection system is included to quickly detect and extinguish any potential arcs. E500 HP is a powerful and reliable ion implanter that can be used in a range of implantation applications. Its advanced features provide accurate and reliable processes with improved device yield while its safety systems ensure optimal process safety. Additionally, its beam delivery systems ensure rapid beam positioning and feedback, creating a reliable, robust implantation process.