Used VARIAN E500 #293625917 for sale

VARIAN E500 is a high-precision ion implanter and monitor used in semiconductor manufacturing. It features a dual-accelerator process with a beam power ranging from 10kW to 30kW. The accelerated particle beam is electronically adjusted and highly reliable, giving users the ability to accurately control the dose, energy, and profile of each implant. This advanced ion implanter is versatile and can be used for implants ranging from high-doping to sub-threshold implants. VARIAN E 500 also includes a reliable beam monitor and in-situ diagnostics to help ensure that the user is getting optimal performance from the equipment. In terms of hardware, E-500 is a vacuum-tight system with a full vacuum chamber constructed from stainless steel. The upper unit includes the ion source, extraction assembly, and a high-precision Quad-Axis Modulator. This modulator is vital in ensuring that the beam is accurately focused and directed. The lower portion is where the sample stage is located, with an XY motion table to enable precise positioning of the sample. The machine also features a scanner assembly to control the ion beam that enters the sample chamber. This scanning assembly has up to four electrical deflection coils to deflect the beam, which allows for accuracy down to sub-micron resolution. Additionally, VARIAN E-500 has an experimental control subsystem, which provides automated parameter setting, profile optimization, and data acquisition. On the software side, the tool is running the Microsoft Windows-based operating asset, which ensures reliable performance. The software provides users with setup flexibility, with the ability to parameterize the beam and monitor chamber conditions. It also features data analysis capabilities, which show the dose and energy of each implant. In terms of safety, the model is equipped with a water-cooled ion source, which prevents the build-up of ions in the equipment, ensuring safe operation of E 500. In conclusion, E500 is a powerful and reliable ion implanter and monitor, capable of handling even the most demanding. It provides precise beam control, in-situ diagnostics, and automated data acquisition, giving users the ability to optimize the implant process. The combination of the equipment and software ensure that users are getting optimal performance from the system, while staying safe and efficient.