Used VARIAN E500 #9024963 for sale

VARIAN E500 ion implanter is a high-performance ion implantation equipment from VARIAN Semiconductor Equipment. It is designed to provide high throughput and accurate, uniform dose and energy distributions for a variety of applications. The system utilizes the latest in mass focussing magnet technology for reliable beam pulse length control, and a sophisticated digital target power supply for precise energy control. The unit is expandable from 14" to 30", with a full range of accessories to maximize throughput. VARIAN E 500 utilizes a hot filament ion source for maximum beam current, even at low energies. The electron compressor allows very fast beam pulses, enabling fine control of dose levels without sacrificing throughput. Beam control is further enhanced by the use of an electrostatic lens machine, optimizing the beam shape and position. The beam is monitored using an electron detector in a Faraday cup, which eliminates the need for an external electrometer. E-500 consists of two subsystems: the implantation tool, and the subfab monitor. The implantation asset includes a quartz chamber, ion source, acceleration tube and vacuum systems, as well as the mass focus model. The monitor uses a specially-designed substrate holder to securely hold the substrate, and a dosage control unit to regulate the implantation process. A beam power supply and beam current monitor allows for accurate control of dose and energy levels. E 500 is designed for high-volume production of silicon and III-V materials, with a maximum dose rate of over 400 A/cm2 per second. The equipment offers a wide range of implantation parameters, and can be tailored to a variety of materials, providing unparalleled accuracy and uniformity. VARIAN E-500 can handle wafers up to 12 inches, and utilizes high-performance source-to-target distance control for accurate efficiency control. E500 monitor system provides precision implantation monitoring and uniformity control, ensuring the highest quality product. Accurate beam and dose current readings are displayed in real-time for easy process monitoring and adjustment. Advanced diagnostics and process monitoring tools, such as the Live-View and OD-View displays, allow for fast and easy troubleshooting of the unit. VARIAN E500 is an advanced, user-friendly ion implantation machine from VARIAN Semiconductor Equipment. With its reliable beam control, accurate dose and energy control, and high-performance production capabilities, VARIAN E 500 is an ideal choice for high-volume manufacturing and uniformity control of semiconductor materials.