Used VARIAN E500 #9085170 for sale
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ID: 9085170
Wafer Size: 6"
Vintage: 2005
Medium current ion implanter, 6"
Signal tower: front panel
Production wafer qty: single wafer
Platen type: M-clamp
Load lock: Left, right (walkout sensor)
System Vacuum:
Ion source chamber
Beam line chamber
End station chamber
Terminal dry: Ebara 4020
Source TMP: Seiko STP-1000C
Source TMPC: Seiko STP-1000C
Resol TPM: Seiko STP-301C
Resol TMPC: Seiko STP-301
Beam line TMP: Seiko STP-1000C
Beamline TMPC: missing
Endstation C/P: CTI On-Board 10F
Compressor: Suzuki
Load lock TMP: Varian CTI100
Load lock TMPC: Varian CTI100
Endstation dry: Ebara 5020 + boost
Process Gases:
AsH3: SDS type, VCR 1/2"
PH3: SDS type, VCR 1/2"
BF3: SDS type, VCR 1/2"
Ar(N2): DISS type, CGA 580
Power Supplies:
Arc: 300VDC, 15A
Filament: missing
Source Magnet: 20V, 50A
Extraction: missing
Extraction suppression: missing
Analyzer magnet: 40V, 125A (Max 150A)
Mirror power supply: 30kV, 2.5mA
(2) Quadrupole Magnet: 20V, 50A
Scan generator: -30kV, 10mA
Mirror: missing
Dipole lens magnet: 40v, 125A (Max 150A)
Acceleration: missing
Acceleration suppression: -5kV, 5mA
Acceleration stack: missing
Controller:
Left Arm Servo
Right Arm Servo
Vacuum gauge
Scan faraday
Platen tilt Servo
Vertical lift orienter
Uniformity
Linear motor servo amp
Orienter
Left elevator
Right elevator
Dose integrator
DI Temp Monitor
Terminal PD DC PS: missing
Options:
Beam energy probe: yes
2_step beam reducer: not used
Auto decel: missing
Gas box type: HP (2 SDS bottles, insert)
Soruth type: Bernas
Faraday type: Varian scanning Faraday
Vaporizer PS: none
Utilities:
Power: 208VAC, 3 phase, 5 wires, 43.2 KVA, 120 FLA
Air: 100 ~ 150 PSI
N2: 40 ~ 150 PSI
Cooling water: 60~150 PSI, 4-21°C
High Voltage Range:
Extraction power supply: 0 keV - 70 keV
Acceleration power supply: 0 keV - 180 keV
1995 vintage.
VARIAN E500 is a high-performance ion implanter and monitor designed to meet a variety of ion implantation requirements. It utilizes a space-saving, single-source power supply and can handle ion beam energies ranging from 1 keV to 10 keV. VARIAN E 500 features a modular design that combines low energy precision implantation capability with high ion current. This superior flexibility provides maximum productivity for a wide range of semiconductor device fabrication operations. In addition to its modular design, E-500 features the latest generation of VARIAN Tandem technology, providing high-precision, high-efficiency implantation of ions into different wafer sizes and materials. It uses a highly advanced tandem technology that creates enhanced beam uniformity, temporal control, and accuracy. VARIAN E-500′s control equipment uses the latest advanced VARIAN ACCeDirect (ActiveConfigured Control) which offers a fully automated, error monitoring system. With the ACCeDirect unit, E 500 can be easily monitored through various sensors, including end of implant monitoring, as well as beam pulse duration and beam positioning feedback. Additionally, this machine provides advanced data analysis and control features which aid in maintaining peak beam uniformity and precision during the production process. E500′s power tool includes a powerful RF power supply with up to 10kW beam energy. This, combined with its modular design, gives it the capability to implant low-energy ions at high-currents. This has enabled VARIAN E500 to produce significantly lower dose rates than most other commercial ion implanters, making it an ideal solution for production-level ion implantation processes. VARIAN E 500 is built with an IEEE-488 communication standard, allowing it to be easily integrated with other types of production equipment. It is also backed by VARIAN commitment to provide the highest level of engineering support. Overall, E-500 is a powerful, yet highly efficient and user-friendly ion implanter and monitor. It provides excellent implantation capability and productivity with adjustable beam energies and precision control options. Additionally, it is compatible with a wide range of devices and provides an open architecture for easy integration into existing production processes. VARIAN E-500 is an ideal solution for any semiconductor fabrication facility in need of a high-performance plasma-based ion implanter.
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