Used VARIAN E500 #9206611 for sale

VARIAN E500 is an ion implanter and monitor designed for use in semiconductor device fabrication, plasma etch, and ion implantation processes. It is a versatile tool for achieving device level control as well as high energy implantation applications. Additionally, VARIAN E 500 offers a range of process and control capabilities, allowing it to be used in a variety of different types of implantation processes. The system utilizes a patented triple-junction design to accurately direct ions for implantation. It is equipped with a dual-axis stage design for precise positioning of the sample being implanted. This is achieved using a mechanical encoder and an on-board computer, allowing the machine to accurately locate samples in the appropriate region for implantation. E-500 is capable of implantation of arsenic, boron, phosphorus, and antimony. It can also be used for implanting phosphorus in high-energy implanted structures. E500 is capable of providing a wide range of dosages so that manufacturers can set implantation parameters for all species and can track a wide range of data. It is specially designed to monitor the implantation process and has the ability to detect any malfunctions or imperfections in the sample. This helps avoid possible damage that would otherwise cause irreversible damage to the finished product. It is also able to monitor the temperatures within the chamber during each implantation cycle and adjust accordingly if necessary. VARIAN E-500 is equipped with an innovative remote access feature so that users can monitor the system from anywhere. This feature is useful for those who are unable to physically be at the machine during implantations. Through this feature, manual input can be done remotely and the data collected during the implantation process can be accessed remotely. Overall, E 500 is a powerful and reliable implantation and control tool for high energy established and established processes. It offers a wide range of processes and control capabilities as well as a remote access feature which makes monitoring and adjusting implantation parameters easier. This makes VARIAN E500 an ideal tool for semiconductor device fabrication, plasma etch, and ion implantation processes.