Used VARIAN EHP-500 #9005445 for sale

Name: VARIAN EHP-500
Brand: VARIAN
SKU: 9005445
Availability: SoldOut

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Ion Implanters & Monitors

Manufacturer

VARIAN

Model

EHP-500

ID: 9005445

Ion Implanter, 8" Software Version : V12.15 rev D Wafer Clamp: e-clamp Gas Box: HP type Gas 1: BF3 HP Gas 2: Ph3 HP Gas 3: AsH3 HP Gas 4: Ar HP Main monitor: CRT touch screen Service monitor: CRT touch screen Traveling Faraday Type TVL New style Auto Decel: Yes Source head: Bernas Hall probe: Gauss probe Pumps: Source Turbo Pump – Seiko Seiki STP-1000C Beamline Turbo Pump – Both Seiko Seiki STP-1000C & STP-300 Endstation Cryo Pump Chamber – V-250 Load Lock – V-300 Source Dry Pump – Edwards IQDP-80 Endstation Dry Pump – Edwards QDP-80 Differential Seals – IQDP80 + Blower Cryo Compressor - 9600 Installed, can be demonstrated 1997 vintage.

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VARIAN EHP-500 ion implanter is a precision-engineered, highly advanced, integrated equipment designed with modern implant engineering and physics in mind. It is a cost-effective tool for researchers and industrial engineers that need to implant ions into a substrate. With VARIAN EHP500, you get amazingly accurate implantation, monitoring and control of the ion current, dose rate and other parameters during the course of the implantation process. EHP 500 constitutes of a source that produces a steady ion beam and an ion-optical system to direct it at the required depth and at the correct angle. It is equipped with a beam current control unit to ensure and accurately adjust the current within a measured range. The machine features a residual gas analyzer to measure the total ion current scattered by the residual gas along with other parameters that can be monitored at any point during the process. In addition to featuring an integrated computer interface for data monitoring, VARIAN EHP 500 also comes with software capable of controlling and setting various parameters. This software includes functionalities like history logging, dose rate and current density control, as well as pulse width modulation and integrated command control. EHP500 is compatible with a variety of ion sources and substrates including strained and relaxed channel ions, channel and regular silicon ion implanting, photoresist and backing structures, as well as p-type and epitaxial substrates. The tool also features a wide range of implantation media including Si, Ge, C, Sn, and CO. EHP-500 is both user-friendly and operator-friendly. It is ergonomically designed to reduce operator fatigue, and its intuitive interface helps increase efficiency. The asset is also incredibly robust; it can handle a wide range of conditions, including elevated temperatures, and is resistant to mechanical shock and vibration. VARIAN EHP-500 is a cutting-edge, versatile, and accurate implantation model that is reliable and easy to use. It is perfectly suited for a wide range of ion implantation applications in research and industry. It is the perfect choice anyone who needs a robust, high-performance ion implanter & monitor.