Used VARIAN EHP-500 #9015612 for sale

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ID: 9015612
Wafer Size: 8"
Vintage: 1998
Medium current ion implanter, 8" Wafer shape: SNNF (Semi Notch No Flat) Wafer cassette: 8" plastic Miraial No SMIF interface Power distribution: 208 V, 60 Hz, 75 kVA, 3 phase Y-connection Control system: 1 GHz computer Software version: 13.43.29 Beam energy: 5-250 keV (single charged ion) 250-500 keV (double charged ion) 500-750 keV (triple charged ion) auto accel/decel mode Gasbox 1: Ar HP external supply Gasbox 2: BF3 HP Gasbox 3: ASH3 SDS Gasbox 4: PH3 SDS Cryo pump: Daikin MARATHON-12 V28MC612SMR Cryo compressor: Daikin U108CW TMP: Edwards STP-1000C TMP 2: Edwards STP-1000C TMP 3: Seiko STP-300C TMP 4: (2) Varian V-300HT Ion source: Bernas type, W-Arc chamber No dual vaporizer No beam reducer Platen: E-CLAMP composite 1998 vintage.
VARIAN EHP-500 is an ion implanter & monitor that is capable of producing and controlling a wide range of surface treatments, enabling a variety of manufacturers to process materials with a range of physical characteristics. It features an integrated graphite focuser, an extended-depth electron miniature ion source, and a patented insulating ion source-shielding equipment. The powerful graphite focuser in VARIAN EHP500 is able to provide a high homogeneous power density on the near and far surface of the substrate, offering a higher degree of precision and control than comparable systems. In addition, the extended-depth mini electron ion source allows for a greater range of energies to work with, as well as increased depth-of-penetration and homogeneity. The patented insulating ion source-shielding system provides a more consistent treatment on the material's surface, further improving accuracy and repeatability. EHP 500 has a variety of customizable parameters to help users achieve the desired outcome from their substrate treatment. This includes a full range of scan parameters, such as scan frequency, amplitude, scan speed, and dwell time, along with adjustable feature parameters like trim size, depth of focuser, gap time, and wafer time. In addition, the device has a powerful process monitor that can immediately assess the progress of the treatment in real time, enabling users to make necessary corrections and adjustments as needed. EHP500 also has several safety features to ensure maximum productivity and personnel protection. It is equipped with an overload protection unit that occurs in the event of a loss of voltage, load, or abnormal current, and shut down automatically if any unsafe conditions exists. Additionally, the device's software is continuously monitored to detect possible accidents or malfunctions in the hardware before they can occur. In conclusion, EHP-500 is an efficient and reliable ion implanter & monitor available on the market, providing users with precise and repeatable surface treatments and numerous adjustable parameters for maximum control. Its powerful graphite focuser, extended-depth electron mini ion source, and insulating ion source-shielding machine offer unmatched accuracy and versatility, while the built-in process monitor and safety features ensure maximum safety and productivity.
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