Used VARIAN EHP-500 #9092902 for sale

VARIAN EHP-500 is an ion implanter and monitor for the semiconductor industry. It is capable of producing high-energy dopant particles with exacting precision, while also providing reliable accuracy and monitoring options for ensuring the desired implantation rate is achieved. The implanter has an integrated power supply that has high current accuracy and stability. It is capable of providing a range of energies with up to 20 microamps on dopant particles and can draw up to 36,000 watts of power. At these levels, VARIAN EHP500 can easily inject and monitor high energy elements in the range of 1-500KeV. This enables the implanter to tailor implants of different dopants to meet the specific application requirements. EHP 500 also uses ion beam energy control and monitoring software that allows for easy verification of the beam's energy profile before and during implantation. Operators can utilize this software to manage up to nine different beam energies and a variable number of durations for maximum implant accuracy. Additionally, the software provides real-time diagnostic feedback to aid in process optimization. In addition to its powerful implanting capabilities, EHP500 monitor also provides in situ ion species monitoring and high-speed data collection and analysis of the deposition process. Its mass spectrometry detector is tightly integrated into the system for analyzing and controlling the ion beam. The monitor measures the extent of implant depth with 10nm resolution, allowing the operator to customize the implant depth and energy across various substrates. EHP-500 is designed to guarantee accuracy and reliability in the production of semiconductor implants. Its power supply and software provide users with the precise control and feedback they need to ensure implants are produced according to the highest standards.