Used VARIAN EHP-500 #9142690 for sale

VARIAN EHP-500 ion implanter is a versatile and reliable ion implantation equipment featuring the capability of implanting high current ions into semiconductor and silicon wafers safely and accurately. This system is equipped with a state-of-the-art high-voltage device capable of reaching a maximum voltage of 40 kV, providing ample flexibility for ion implantation over a wide range of substrate materials. The ability to handle particles as large as 200 keV allows for different materials to be implanted, while still being able to ensure a highly accurate result. The implantation chamber is designed to handle the insertion of ionization sources, the majority of which can be performed in-situ, allowing for quicker and more efficient throughput of substrates. In addition, the chamber is designed to handle overpressure up to 10-4 Torr, making it suitable for both dry and wet introduction of ions into the wafer. VARIAN EHP500 is designed to accommodate a broad range of substrates and is made from materials that are conductive, corrosion-resistant and radiation-proof. Along with the implantation chamber, EHP 500 is fitted with a sophisticated ion monitor capable of monitoring a range of parameters in the implantation process. This includes beam current, beam position, beam alignments, ion kinetic energy, substrate distance, substrate temperature and doping concentration. The monitor is also capable of real-time and post-implant data logging, allowing operators to analyse and adjust implantation parameters quickly and accurately. In addition, EHP500 possesses a graphical user interface that allows the operator to visually control each of the implantation processes through a graphic screen. For example, an operator can adjust the beam alignment, ion energy, substrate distance and other parameters directly from the monitor, in a matter of seconds. The user interface enables a rapid turnaround of implants and also facilitates the measurement of post-implantation parameters, such as leakage current and junction depth characterization, ensuring that only the highest quality implanted samples are delivered. Finally, EHP-500 is equipped with a secondary electrospray unit capable of creating an electric field to rapidly move ions into the implantation chamber, allowing highly even and reproducible results when moving the substrate at low speeds. This advanced unit is suitable for all types of implantations, such as those involving low doses and high voltage. In conclusion, VARIAN EHP 500 is a reliable, versatile and highly accurate ion implantation machine capable of implantation into various substrates. The sophisticated monitor and user interface enables simple operation of the implantation process, while the advanced electrospray unit ensures accurate and even implantation into each sample.