Used VARIAN EHP-500 #9181387 for sale
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ID: 9181387
Medium current ion implanter, 8"
E-Chuck
Main components:
End station module
Services module
PC / Monitor
LCD Monitor
Controllers
Vertical lift orienter
Vacuum gauge
Uniformity
Left elevator
DI Temp monitor
Terminal module
Remote PC and monitor
Accel column
Accel stack
Accel PSU & tray
Accel suspension PSU
Enclosure
Signal tower & HV
Exhaust leakage box
Signal tower cont box
End station services module controllers:
Left arm servo
Right arm servo
Vacuum gauge
Scan faraday
Platen tilt servo
Vertical lift orienter
Uniformity
Liner motor servo
Orienter
Left elevator
Right elevator
Dose intergator
DI Temp monitor
E Clamp PSU
UPS
Terminal PSU's and assy:
Faraday cup assy
Extraction manipulator
Motion controller
Swing out arm decel
Relay arm decel assy
Set-up mirror assy
Neutral dump assy
Anal beam dump assy
Source mag assy
Anal mag assy
Quad mag assy
Lens mag assy
Scan controller
Scan generator: 30kV
Set-up faraday pre amp
Vacuum gauge cont
Scan assy
Quad 1 mag PSU
Quad 2 mag PSU
Analyzer PSU
Extraction PSU
Lens PSU
Suppression PSU
Mirror 60kV PSU
Source mag PSU
Source head and gas cabinet:
Source head
Arc PSU
Filament PSU
Gas module:
(2) AsH3: SDS
PH3: SDS
(3) BF3: SDS
(4) Ar: Diss, CGA 580
Vacuum system:
Make Model Description
EDWARDS 1003C Source turbo pump
VARIAN V300HT Resolve turbo pump
EDWARDS 1003C Beamline turbo pump
CTI On-Board 10 Endstation cryo pump
CTI 9600 Cryo compressor
VARIAN V300HT Load / L turbo pump
VARIAN V300HT Load / L cryo pump
EBARA 50X20 Endstation dry pump
EDWARDS QDP80 Terminal dry pump
Additional parts / Spares:
CCTV: ESC Type
1998 vintage.
VARIAN EHP-500 is an advanced ion implantation and monitoring equipment designed to handle a variety of materials and ion species over a wide range of powers. The system is based on a multi-energy, multi-ion integration control platform, ideal for applications such as semiconductor device fabrication, nanotechnology, physical vapor deposition, thin film deposition, ion beam figuring, medical physics, and other areas. The main features of the unit are its high implantation accuracy, uniformity control, and low particle contamination and scatter events. VARIAN EHP500 uses a high-precision hexapole ion source that can impart a wide range of energies, angles, and powers. This feature allows for precise ion implantation with near-zero inefficiency and uniformity. The machine also includes an advanced control tool, allowing users to precisely control parameters such as acceleration potentials, beam intensities, position accuracy, and beam focusing. EHP 500 also features an integrated beam monitoring asset, which provides better overview and control of the process. The beam monitors utilize a variety of detectors including Faraday cups, ionization chambers, and a range of digital probes. The model also offers a wide range of programmable functions, such as automatic beam blanking for certain ions, process step initiation, and auto nulling. The equipment can be installed in a variety of working environments including clean rooms, control rooms, and remote locations that require extra security. The user-friendly interface and advanced diagnostics of EHP500 make it an ideal choice for research and industry applications. VARIAN EHP 500 is also used to perform more complex monitoring tasks such as depth profiling, damage assessment, PID analysis, and beam steering. These tasks can be performed in auto-mode or step-by-step mode, and provide real-time feedback for better process control and optimization. In summary, EHP-500 is an advanced ion implantation and monitoring system designed for highly accurate, uniform, and clean implantation of a variety of materials and ion species. The unit is made up of a highly precise hexapole ion source, integrated beam monitoring machine, and various programmable functions, and offers a great deal of flexibility and enhanced accuracy for a variety of applications.
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