Used VARIAN EHP-500 #9215996 for sale
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ID: 9215996
Wafer Size: 8"
Vintage: 1998
Medium current ion implanter, 8"
Mirror 60 Kv PSu: E110002
Gas box configuration:
Gas box type: SDS
Gas line 1 = PH3
Gas line 2 = AsH3
Gas line 3 = BF3
Gas line 4 = Ar
Pumps configuration:
VARIAN V300HT Resolver turbo pump
Endstation CRYOPUMP CTI on-board 10
CTI 9600 Compressor
Loadlock turbo pump VARIAN V300HT
EBARA Endstation dry pump: 50 x 20
EDWARDS QDP80 Terminal dry pump
Electrical facility requirements
208 V, 3 Phase, 5 wire 43.2 KVA 120 FLA
200A Main CB 42,000 AIC 60 Hz
75A Maximum single load
250kV Maximum beam energy
1998 vintage.
VARIAN EHP-500 is a high-precision ion implanter and monitor. This heavy-duty instrument utilizes an ion source, a high voltage power supply, an extractor, a scan magnet, a deflector assembly, a Faraday cup, and a beam monitor. The ion source produces high-energy ions, which are then accelerated by the high voltage power supply to the desired energy. This energy is then optimized by the extractor, which is a magnetic assembly used for controlling the ion beam. The scan magnet is an assembly used for controlling and scanning the ion beam, while the deflector assembly is used for shaping the ion beam's trajectory. Next, the beam passes through a Faraday cup, which measures the beam's intensity. Finally, the ion beam passes through the beam monitor, which provides feedback on the beam's current, voltage, and energy. This instrument's ability to control, monitor, and shape the ion beam makes it an ideal choice for high precision ion implantation and monitoring.
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