Used VARIAN EHP-500 #9315482 for sale
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VARIAN EHP-500 Ion Implanter and Monitor is a high performance ion implanter and monitor with a wide range of capabilities. It is designed to provide high-precision implantation and precision process control in both low and high-duty cycle. VARIAN EHP500 can be configured as a stand-alone implanter or as a process control unit, enabling maximum performance and flexibility. EHP 500 utilizes a number of advanced technologies, including a high resolution digital ion energy spectrometer and a digital mass spectrometer for quick, accurate measurement of implanted ion species and dose. This system also features a high fidelity particle match engine that enables the user to quickly and efficiently optimize the implantation process for optimal uniformity and precision. EHP-500 also features advanced ion optical capabilities and a wide dynamic range (WDR) control to enable implantation of variable beam scans for uniformity and precision. VARIAN EHP 500 employs a number of advanced automated features offering high accuracy for both implantation and process control. The system utilizes programmable high/low voltage generator and a high-speed autostep module for variable rate implantation. The high power, compact ion source allows implantation of low energy ions at high rates with superior positional accuracy. EHP500 also offers precision post-implantation cleaning of the wafer. VARIAN EHP-500 system also provides a variety of monitoring functions, including the ability to remotely monitor the process and its parameters, as well as to provide real-time feedback on the implantation process. This monitoring function is further enhanced by an advanced integrated data logger, that records all process parameters and results associated with the implantation process. This data can then be accessed and analyzed remotely through an Ethernet interface or remotely monitored with an optional user interface. Overall, VARIAN EHP500 Ion Implanter and Monitor is a high performance ion implanter and monitor offering the user maximum process control, precision, and flexibility. It integrates advanced ion optical capabilities, a wide dynamic range control, and an advanced integrated data logger for optimal performance and optimal implantation results.
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