Used VARIAN / GENUS 1510 / 1520 #9228263 for sale

GENUS 1510 and 1520 are devices used for the implantation and monitoring of ions into a substrate. They are designed for use in semiconductor and nanotechnology-based manufacturing processes. The 1510 provides a focused beam of ions which is accurately implanted into the substrate, while the 1520 is an ion siphon-type monitor used to measure the parameters of the implanted beam in order to ensure the highest level of repeatability and accuracy. VARIAN 1510 features a dual-cathode technology that allows for the independent control of each of the two anodes in the substrate, as well as an even distribution of ions across the surface. This ensures a uniform and consistent implantation throughout the process. Some of its key features include an auto-align beam alignment system for improved beam accuracy, an adjustable implant energy for different substrates and adjusted process time for faster substrate processing. The 1520 ion monitor, on the other hand, features a sensitive and dependable ion gate that allows for a precise measurement of the ion current and ion flux rate of the implanted beam. This helps ensure the accuracy of the process and is essential for achieving high-quality semiconductor devices. The 1520 can also be used to measure the overall positive/negative flux, peak-to-peak thickness, and ion quality of the implant. In conclusion, VARIAN / GENUS 1510 and 1520 are essential tools for ion implantation and process monitoring in the semiconductor and nanotechnology industries. Their precise, accurate and repeatable operation ensures that high-quality devices can be manufactured with a minimum of effort. For these reasons, they are an essential part of any process engineer's toolkit.