Used VARIAN / GENUS 1520 #293642980 for sale

ID: 293642980
Wafer Size: 6"
Ion implanter, 6".
VARIAN / GENUS 1520 ion implanter and monitor is an advanced system for implanting ions into semiconductor materials. It is capable of precisely controlling the ion delivery, enabling the use of different implant energies, species, lot sizes and dose rates. GENUS 1520 also features full automation options, allowing for multiple implants to be performed with minimal operator involvement. The system provides extremely accurate dose control, allowing for highly repeatable implant doses. This enables users to produce implants with consistent results, reducing the risk of costly particle damage to silicon substrates. VARIAN 1520 is equipped with the latest in monitoring and process software, making it a comprehensive tool for advanced ion implantation. 1520 utilizes the RF based high power, high voltage capability of GENUS Rexolite and SHI Thalium targets. This allows for high current delivery and high substrate doping rates with minimized thermal damage. The ion source assembly supplies ions to the target and is composed of a pair of extraction electrodes, a source and a scan coil. The scan coil is used for the profiling of the implant and can be optimized to achieve a highly localized implant profile. VARIAN / GENUS 1520 also features a range of ion selection (isolation) options, such as mass analysis, charge stripping and multiple species implants. Mass analysis options allow for the selection of specific ions species to be implanted whilst the charge stripping option can be used to reduce substrate doping with contamination. The multiple species implant option allows for improved accuracy and repeatability when implanting two or more species. GENUS 1520 is a powerful system for creating complex, high quality microelectronic devices. With its range of automation and implant control capabilities, it is a valuable tool for the production of quality wafers. It is the ideal choice for users looking to produce highly repeatable implants with minimized substrate damage.
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