Used VARIAN / GENUS G1510 #9011839 for sale

VARIAN / GENUS G1510
ID: 9011839
Wafer Size: 8"
High energy implanter, 8" Pumps are missing.
VARIAN / GENUS G1510 is an ion implanter and monitor that provides breakthrough capabilities for ion implantation. It is a high-end device that is used for the production and monitoring of ion implantation processes. GENUS G1510 is designed for enhanced ion implantation throughput while maintaining accuracy and repeatability. It offers a highly precise beam current control equipment for accuracy and repeatability. The device also includes an advanced beam diagnostics system for optimizing the implantation process. VARIAN G 1510 is designed for high throughput with low contamination. It offers three beamline configurations for generating low, medium and high currents. This allows for implementation of highly specific beams for different applications. The device integrates with GENUS automated control and monitoring unit which provides programmable process control. The machine includes a tool Energy Management package for beam optimization. The asset also offers a powerful data acquisition and analysis model for a comprehensive understanding of the etch process. VARIAN / GENUS G 1510 features two integrated beamline management systems. The first equipment directs and monitors beam direction and energy, and the second manages the acceleration and charging of the implanted species. This allow for highly accurate implantation and monitoring. The device includes an advanced chamber design and is engineered to operate in extreme conditions. The high temperature stainless steel chamber ensures that the implantation process can be safely and accurately conducted. G 1510 also provides a comprehensive implantation suite. This suite includes a software and hardware package that allows for automated control, monitoring and analysis of the implantation process. The software includes graphical user interfaces for easy operation and includes a special feature that automatically alerts when the process is out of specification. Overall, GENUS G 1510 is a highly reliable and efficient ion implanter and monitor for precision and repeatability. It's advanced design features and automated control and monitoring capabilities make it the ideal choice for high throughput and accurate implantation.
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