Used VARIAN Solion+ #9130269 for sale

ID: 9130269
Wafer Size: 12"
Vintage: 2011
High current implanters, 12" S2 Compliant Chiller (2) Cryo pumps (4) Turbo pumps (3) Dry pumps 2011 vintage.
VARIAN Solion+ is a state-of-the-art ion implantation and monitoring equipment designed for precision control of ion beam implants. It is composed of a wafer handler, implanter and monitor, beam manipulation system, RF-DC hybrid separator, and target/electron gun. The wafer handler includes a motorized mechanism to move multiple wafers in-plane and out-of-plane. The implanter includes a high-intensity, multi-mode ion source, a sophisticated focusing unit, and a wide range of accessory components for the implanting of various ion species. The monitor includes an advanced beam profile monitoring machine, which features real-time visual feedback and control. The beam manipulation tool includes a powerful control asset for position and energy scanning, and a wide range of beam manipulation components to precisely control the implant conditions. The RF-DC hybrid separator is designed for superior resolution and can be used for both positive and negative ion implantation, with a range of voltages and separator voltages. The target/electron gun model allows for optimal analysis of the desired ion implant profile. Solion+ provides a high degree of control and flexibility, allowing users to customize their ion implant conditions for each unique application. Parameters such as voltage, current, beam energy, beam spot size, beamlet intensity, and beamlet position can be adjusted to fine-tune the implant profile. The equipment also offers built-in safety features, such as over-voltage protection and back-up power supply, to ensure safe operation. In conclusion, VARIAN Solion+ is a powerful ion implanter and monitoring system that provides superior control and flexibility for precise implant conditioning. With its sophisticated beam manipulation unit, RF-DC hybrid separator, and target/electron gun, Solion+ offers a wide range of options to customize implant conditions for any application.
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