Used VARIAN / TEL / TOKYO ELECTRON FBR II / HPS-T001 / HT II #9187207 for sale

VARIAN / TEL / TOKYO ELECTRON FBR II / HPS-T001 / HT II is an ion implanter and monitor developed and manufactured by TEL, a leading supplier of semiconductor manufacturing equipment. The device is designed to increase the speed and accuracy of semiconductor device production. The FBR II is an efficient and reliable ion implanter and monitor equipment that utilizes Faraday Cage technology. It features a vertical Faraday Cage that increases ion current accuracy and a unique helical induction lens which disperses ions in a uniform manner, maximizing uniformity within the application chamber. The FBR II's high level of accuracy, reliability, and speed provide fast and precise processes for semiconductor device production. In addition to ion implanting, the FBR II also features a built-in monitoring system. This monitoring unit uses a variety of sensors and signals within the tool, allowing it to measure various parameters such as temperature, contamination, and substrate characteristics. The monitoring machine can be used to improve overall process accuracy and predict potential failures. The FBR II also features a wide range of accessories and components which allow for a wide range of semiconductor device manufacturing applications to be carried out. It can be used for a variety of processes, such as implantation, photoresist strip, annealing, vacuum deposition, and wafer testing. The FBR II also includes a range of other components such as a substrate transfer mechanism, an in-line substrate heater, and programmable drift screw. Overall, TEL FBR II / HPS-T001 / HT II is an efficient and reliable ion implanter and monitoring tool that can be used to increase the speed and accuracy of semiconductor device production. It features an advanced Faraday Cage and a unique helical induction lens that provide precision and reliability, a built-in monitoring asset that helps with process control and maintenance, and an array of useful accessories. All of these features contribute to the FBR II's reliability and effectiveness for a range of semiconductor device manufacturing applications.