Used VARIAN VIISion 80 #9039543 for sale

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ID: 9039543
High current ion implanter, 6" Safe Gas Delivery System Cryo, fourth implant chamber SECS II automation Two dimensional beam profiler Angled implant, automatic Classic End Station Includes: +7 to -7 degree wafer tilt angle. Plasma flood gun. Horizontal wafer handling. Full system automation. Operator touch screen. Tungsten Bernas ion source. Silicon coated disc and spillover cup. 3 light signal tower Source and beamline turbo pumps removed, but they’re both inside the tool Controller for the beamline pump is removed, but it’s inside the enclosure Currently the disk and spindle are removed, but all the parts are present for it Converted to 150mm in 2011 1995 vintage.
VARIAN VIISion 80 is a high-performance ion implanter and real-time monitor suitable for medium-to-high current production. It is capable of implanting up to 80mA of current into delicate substrates, while simultaneously dispatching an accurate, on-line monitoring of the process. Expert engineering ensures reliable and repeatable proficiency with low energy and high currents. It is designed as a full-crystal system that enables robust target optimization to support various levels of complexity. This allows users to fine-tune the production process and ensure the perfect balance between productivity and product quality. Additionally, the implanter is equipped with a multi-level monitor, enabling users to track ion range, profile, and beam emission during the processing. VIISion 80 features a patented HDG (High-Definition Gun) that uses ultra-short implosion times and spatial control of the target tissue. The HDG acts as a high-definition processor and combines energies, doses, and spatial control to deliver intrinsically accurate and repeatable doses. Moreover, its wide variety of implant combinations make it a versatile tool for regularly changing substrate requirements, and its abradable seal technology increases beam stability during long-term processing. Its design optically measures the ions in various directions. The system can then reconstruct the dosimetry at any view angle with the help of both low- and high-angle signal measurements. This real-time dosimetry offers greater control and precision while minimizing the time needed to adjust process parameters. Additionally, VARIAN VIISion 80 is equipped with several sensors that monitor the beam current, particle trace, electrostatic lenses, and space charge. The monitoring system also has an intuitive graphical interface, so users can select settings quickly and have access to an easy-to-use diagnostic guide. VIISion 80 is ideal for medical, automotive, electronics and semiconductor industries, as it provides efficient production with strict quality control. Ultimately, it helps reduce costs and provides peace of mind for companies looking for a reliable and consistent ion implanter for their production needs.
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