Used VARIAN VIISion 80 #9039557 for sale
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ID: 9039557
High current ion implanter, 8"
Safe Gas Delivery System
Cryo, fourth implant chamber
SECS II automation
Two dimensional beam profiler
Angled implant, automatic
Classic End Station
With the addition of: Zero integral magnetic faraday
Includes:
+7 to -7 degree wafer tilt angle.
Plasma flood gun.
Horizontal wafer handling.
Full system automation.
Operator touch screen.
Tungsten Bernas ion source.
Silicon coated disc and spillover cup.
3 light signal tower
1995 vintage.
VARIAN VIISion 80 is a high energy, high throughput ion implanter intended for use with semiconductor and microelectronics production. It is designed for applications where the implant dose, energy and fluence of the ions must be tightly and accurately controlled. VIISion 80 enables ion implanting of a wide variety of materials with a variety of beam configurations, featuring excellent uniformity and repeatability. VARIAN VIISion 80 utilizes a tetrode, parallel electron gun and a split beam cathode arrangement, to deliver up to 80kW of ion implantation energy. The gun operates at a neutral energy of 5-200 kV and provides a maximum of 15mA beam current. The gun is capable of delivering ions ranging from 2 to 254 amu, with an energy range of 100 keV to a maximum of 80kV. The ion beam spot size can be configured between 0.3-1.0mm. The equipment features a high capacity power module that offers reliable, repeatable and highly accurate implant capabilities. It also offers user-customizable implant profiles, allowing for optimized ion implant operations. The system includes a scanning beam current control which can achieve repeatable, uniform implant results. VIISion 80 also features a unique monitoring unit that allows for the measurement and control of the background current, chamber performance, beam current, and implant uniformity. This monitoring machine is critical to ensure high-precision, repeatable implant operations. The monitor tool offers numerous self-diagnostics that alert the operators to any anomalies or errors. Finally, VARIAN VIISion 80 is designed with safety in mind, featuring a safety interlock asset that blocks access to high voltage components as well as a ground connection for adequate electrical safety. The model also contains several hardware and software components that are designed to ensure reliable operation and reduce the risk of injury. In conclusion, VIISion 80 is a highly accurate ion implanter, capable of delivering ions over a wide range of energies and utilizing a unique monitoring equipment to ensure repeatable, uniform implant operations. The system is designed to be simple to operate, yet highly reliable and safe. With its state-of-the-art power supply, VARIAN VIISion 80 is well suited for semiconductor and microelectronics production.
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