Used VARIAN VIISion 80 #9162800 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9162800
Wafer Size: 8"
Vintage: 1995
Ion implanter, 8"
L/L Dry pump type: VARIAN Tri scroll pump
Source / Beam line turbo pump:
PFEIFFER TMH1601P
LEYBOLD MEG W1300
L/L Turbo pump: VARIAN V250
Process chamber: (4) CTI 250F Cryopumps
Gas channel 1: AsH3 Gas VCR 1/2" high pressure
Gas channel 2: PH3 Gas VCR 1/2" high pressure
Gas channel 3: Ar Gas CGA580 high pressure, UFC-8160
Gas channel 4: BF3 Gas CGA330 high pressure, UFC-8160
PFG Gas: Xe Gas CGA580 high pressure, UFC-8160
Memory upgrade: Yes
Main CB: 90 Amps
CVCF CB: 50 Amps
Auto disc angle motor: Yes
Host: SECS
Throughput (WPH): N6, 230 WPH
Disc site type hook site: (13) Sites
Elevator type modified 25
Lower slide pin: Yes
Laser align kit: No
W/H align kit: No
Remote pallet: No
Utility supply type: Bottom
Power 208 VAC, 3 Phase, 5 wire, 50/60 Hz, 35 kVA
Water: 40~100 psi
Air: 90~125 psi
PN2: 50~100 psi
GN2: 50~100 psi
Exhaust: 1600 cfm
Missing parts:
(4) Gasbox bushings
Source head assembly
Arc chamber assembly
Vapour end cap plate
Gas line
Dip seal pump
Beamline turbo pump set
Turbo pump
Power cable
Controller
Terminal RDAC board
Analyzer gauss probe
Rotary slit assembly
Remote rack
DI Colling system
PCW Manifold
(2) Cryo compressors
(2) Dry pumps: IQDP 80
Remote rack accesory
End station turbo pump set
Signal tower
External AC filter
Disc assembly
Spin drive assembly
Main drive shaft stand plate
Main drive shaft
Spin magnet assembly
Rotary union
Resolver shaft assembly
Encoder shaft assembly
Main pulley
(2) Resolvers / Encorder pulleys
(2) Belts
Spin magnet guide plate
(8) Plate stand blocks
(2) Spilcover cup cooling bellows
Currently de-installed and warehoused
1995 vintage.
VARIAN VIISion 80 is an ion implanter and monitor manufactured by VARIAN Semiconductor Equipment Associates. VIISion 80 is a highly efficient and reliable tool for implanting, monitoring and analyzing ions during semiconductor device manufacturing processes. VARIAN VIISion 80 features a highly advanced and intuitive interface, combining all the necessary display, control and measurement functions into a single unit. VIISion 80 utilizes a wide range of sensors and detectors to precisely control implantation and monitor the ion bombardment process. This equipment has an adjustable high-voltage anode, allowing for the implantation of both positive and negative ions to depths up to 0.5 mils. It also utilizes a built-in current monitoring option, allowing operators to make sure their implantation process is always under their desired level of control. VARIAN VIISion 80 allows for easy integration into existing automated testing and semiconductor fab equipment. This system is also compatible with other ion sources, such as metal evaporation or silane sources, making it ideal for a versatile range of implantation needs. In addition to its robust implanting capabilities, VIISion 80 features a unique monitoring unit that allows it to read back ion current levels in real-time. This machine includes an ultrafast broadband microchannel plate detector and a compact control console with a large LCD display providing the user with a comprehensive overview of the implantation process. For added safety and convenience, VARIAN VIISion 80 includes a dedicated safety monitor that informs operators in the case of any irregularities during the implantation process, such as an overvoltage or an unexpected current surge. The tool also features as an adjustable floor-level kV monitor that is individually calibrated to ensure repeatable implantation results. In summary, VIISion 80 is an established ion implanter and monitor, designed to provide precise levels of control and flexibility for all semiconductor device manufacturing needs. Featuring advanced sensors, intuitive interface and dedicated safety monitoring, VARIAN VIISion 80 is an effective and safe tool for implanting and analyzing ions.
There are no reviews yet