Used VARIAN VIISion 80 #9181390 for sale

VARIAN VIISion 80 is an ion implanter and monitor designed for the production of ionized materials and the monitoring of ion implant processes. It is a tool used to process a broad range of doping profiles designed for multiple applications, from common semiconductor materials to advanced compound semiconductors. Furthermore, VIISion 80 offers unparalleled throughput rates, precision, and accuracy for optimum ion implant process control. VARIAN VIISion 80 is made up of two separate components: the ion beam generator and the control console. The ion beam generator is a low-loss, highly reliable, low-noise and low-vibration ion source that makes the ion implant process extremely reliable. This ion source is capable of generating a near-continuous beam of ions that are sufficiently stable to enable exact control of the implant. The control console is the command-and-control center for the implanter and is responsible for controlling, monitoring and executing the implant process. It consists of an intuitive graphical user interface (GUI) and programmable logic controllers (PLCs) that enable the user to control implant parameters, monitor the implantation process, and store the results for later review. VIISion 80 offers the user maximum process control with state-of-the-art fabrication techniques and sophisticated instrumentation. To ensure the highest quality and accuracy of implanting, VARIAN VIISion 80 uses a multiple source technique for enhanced beam stability and unparalleled accuracy and repeatability of implant dosage. The multiple source technique also enhances the life of the source as well as improves overall process reliability. VIISion 80 also provides excellent ion implant selectivity, allowing for finely tuned doping profiles with a broad range of doping regimes. This provides the user with an unprecedented level of flexibility and control over their implant processes. VARIAN VIISion 80 is also capable of delivering a high-current beam with maximum beam current of up to 3.5A. Furthermore, the control console's interface allows for real-time control of beam currents and voltage levels. In conclusion, VIISion 80 is an advanced ion implanter and monitor designed to provide maximum process control and accuracy with unparalleled accuracy and repeatability. VARIAN VIISion 80 offers features such as multiple source technique and high-current beam delivery that ensure maximum flexibility and control over the implant process. Additionally, the intuitive control console interface allows for easy implant control, monitoring and review.