Used VARIAN VIISion 80 #9212872 for sale

VARIAN VIISion 80 is a high-end ion implanter and monitor capable of ion implantation and monitoring of integrated circuits and other semiconductor devices. It is designed to provide superior accuracy and performance when it comes to implanting ions, allowing users to achieve exact doping concentrations and desired surface profiles on dies. VIISion 80's advanced technology and intuitive user-interface allows even inexperienced staff to gain an immediate understanding of the equipment, allowing them to quickly alter settings to adjust for different substrates. VARIAN VIISion 80 features a range of impressive precision and safety features that increase the accuracy, safety and efficiency of ion implantation. The ion source delivers a uniform pattern of high-energy ions, ensuring a consistent implant for each wafer, whilst the automated dosemeters monitor and adjusts the beam intensity as required. VIISion 80 also comes with a two-zone optical calibration system, which ensures accurate and precise impact of the substrate. Lastly, the unit's advanced electronic monitoring machine ensuring that the accurate implantation occurs. The tool contains a number of components and features that makes it able to withstand the rigours of ion implantation. It is capable of transmitting ions up to 20keV and the beam can be spread up to 20mm with no significant deterioration of implant performance. The asset's quartz optical window has been developed for extreme environmental conditions, and its vacuum chamber has huge range of pressures. The multiple lamps in the model assure even lighting, irrespective of the wafer type and size. VARIAN VIISion 80's sophisticated monitoring equipment continually tracks the implant process and status, enabling users to make changes according to the information presented. The system is also capable of providing a wide range of reports and graphs to offer a detailed analysis and review of the implant process. As part of the monitoring package, the unit's advanced ion-counter provides an accurate number of implanted ions in real-time, allowing users to eliminate guesswork and manual calculations. Overall, VIISion 80 is an exceptional ion implanter and monitor which contains many advanced features that enable users to achieve precise and accurate results with greatly reduced process times and costs. Its intuitive interface allows users of any level of expertise to quickly gain a handle on ion implantation and settings, allowing experienced grantee staff to make necessary adjustments in a timely manner. Making it ideal for large-scale industrial semiconductor applications.