Used VARIAN VIISion 80 #9257909 for sale

VARIAN VIISion 80 is a three-axis ion implanter and monitor equipment designed for automated implantation processes in semiconductor manufacturing. It is a robust system featuring in-situ monitoring sensors for over-dose protection and monitoring of depth control. It is designed for ultra-high doses and can be used for both medium and low voltage implantation. VIISion 80 features a three-axis motion control unit with a maximum velocity of 60 m/min, which ensures quick implantation times for larger ovens. The machine also features a high-power, two-beam implanter designed for medium and low-voltage implantation. The electric field lines are minimized due to the advanced electric field distribution and alignment design, which allows for greater accuracy and reduced dose nonuniformity. VARIAN VIISion 80 includes industry-leading sensors and monitors for capability verification, dose control, and tool monitoring. An over-dose protection asset (ODPS) detects discrepancies in photon dose, preventing over-dosing in high-dose implantation processes. Additionally, the model has in-situ monitors for the precise digital control of dose, energy, angle, and time along the beam line to maximize implant homogeneity and dose uniformity. VIISion 80 is also designed for flexibility and scalability, allowing for integration of additional technological components and changes to the implantation process without needing major control modifications or reengineering. This allows for future upgrades and adaptability in order to facilitate changing technologies. VARIAN VIISion 80 features adaptive electron gun controls for optimized beam line performance and uniform dose. The equipment can also be configured for different implantation requirements including beam-on control and vacuum optimization. Lastly, the system is precision-engineered with user-defined parameters, engineered to customer-specific needs. Overall, VIISion 80 is a three-axis ion implanter and monitor unit designed to optimize implantation processes. It features a high-power two-beam implanter, over-dose protection machine, in-situ monitors, and adaptability for future upgrades. The tool is specifically engineered for process control, dose control, and accuracy for quick and reliable implantation processes.