Used VARIAN VIISta 3000HP #9203292 for sale
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ID: 9203292
Wafer Size: 12"
Vintage: 2005
High energy implanter, 12"
Energy range: 10 keV to 3750 keV
Voltage divider
Base system
Power Distribution: 60 Hz
Solid state: 0.75 MV D.C.Tandetron(TM)
Accelerator provides:
High output tandem NSI power supply
ASME/TUV Certified accelerator pressure vessel
VIISta single wafer processing end station with integral orientation control 0º- 360º at +/-1º accuracy
Precise control of tilt angle combined with fast recipe controlled stepped tilt modes up to +/- 60º at
An accuracy of +/- 0.1º
Gas cooled electro-static platen
Vertical scanning using linear servo motor driven
Industrial air bearing
Dual wafer capacity: 25
Polished load-locks with independent vacuum control
Load lock: 300 mm
Automatic pumping system includes:
VARIAN Triscroll 300 dry pump for the air-bearing differential seals stage One
Diaphragm roughing pump for the air bearing differential seals stage two
Venturi pump for the air-bearing differential seals stage three
(5) HELIX cryo pumps
(3)400mm HELIX standard capacity cryo pumps on the process chambers
(2) 250F HELIX high capacity cryo pumps located on beamline
(2) PFEIFFER TMH-261 turbomolecular pumps for the end station load locks
Turbomolecular pumping system consisting of:
PFEIFFER TPH 2101 for the source
(2) PFEIFFER TPH 2101 Pumps for the beamline locations
Remote pump kit:
To locate two cryo compressors
DI water system
Remote power distribution system includes
Standard and included in base system: 15 meters
Base system does not include roughing pumps
VARIAN VIISta control system
Microsoft windows NT(TM)/Windows 2000(TM)
Multitasking operating system
Next generation software control system monitoring over 3500 implant
Equipment parameters for optimal system performance
Automatic recipe set-up
Optimization
Control
Production scheduling
WIP Tracking
System diagnostics
Single wafer data logging
HSMS
SECS / GEM Compliant
Multilevel password protected security system
SPC Capability
Small WIP buffer with 4 load ports
Toxic gas box including:
Standard inert gas module
Exhaust connections from the top
source
(3) Standard process gas modules
(3) manometers
(2) exhausts
(5) Gas modules plus Inerts
(3) Plus Inerts are supplied as standard
Long life indirectly heated cathode ion source
Differentially pumped ion source chamber
System S2-93
CE Compliance
High voltage warning displays
3 Locations
System signal tower
Telemechanique
(3) Lights:
Green
Amber
Red
Un-interruptible power supply (UPS) to support control system
platen
EMO Interlocked vesda smoke detection system
Source exhaust flow interlock
Integrated weight handling tools
EMO Safety interlock
Lead floor not required
Required selects
Standard power kit: UES
Standard frequency kit: 60 Hz
Facilities from top
Signal tower: 3 Light standard RYG
Standard gas box internal process / External purge
Gas box exhaust from the top
HP Ar / N2 DISS 718
HP BF3 DISS 642
SDS PH3 VCR 1/2"
SDS AsH3 VCR 1/2"
Standard on tool chiller
Phase 2 IHC source without vaporizer
HELIX standard cryo kit: 400
Standard polyflow cryo exhaust
Customer supplied pumps to VSEA - Edwards iH-80
VSEA Supplied pfeiffer turbo pump kit
Load lock vent standard finish
Vent connection standard finish
High voltage warning display
Remote connection kit standard cryos: 15 Meters
(3)Anometer
gauges 0: 1kPa
Monitors exhaust pressure of the main gas box
Source shroud
Rough pump
Standard UPS
V3000 Factory automation kit: Micron
Includes indicator control kit
E11134600
Hermos integration kit
E11139470
Hokuyu E20000323 x 4
Vacuum connections from the bottom
Thru-beam wafer mapping
Installed Options:
Wafer viewing and wafer Id
SW - SEMI E58 ARAMS compliance
HP BF3 DISS 642
Graphite kit metals reduction
Service monitor PC
Modification in 2009:
V-Mask II upgrade kit
Roplat: 300MM
NCS Computer kit
Modification in 2013:
VIISta 3000 S/N ES154017 upgrade
E11451460 2Ghz Control system
UES
NCS
IAN
Dose controller eprom kit for medium current implanters
E11408090 for EHP dose contrllers
E11436450 for XP/XPT
Dose controllers reference PSB3312L EHP dose contrllrs
PSB3651-XP/XPT dose contrllrs
2005 vintage.
VARIAN VIISta 3000HP is an advanced ion implanter equipment used for the implantation and analysis of ions in substrates such as semiconductor wafers or glass. This system is composed of several components that allow it to function with high precision. VARIAN VIISTA 3000 HP beam line begins with the ion source, where an ion beam is generated, manipulated, and focused. The ion source can be either a metal evaporator, a metal-oxide source such as titanium, zirconium, or barium, or a field-emission ion gun. After forming the initial beam, the beamline then passes through the beam optics components, including the mass analyzer and final aperture, for control of the beam as well as energy adjustment. VIISta 3000HP includes a variety of analysis and implantation chambers. The analysis chambers allow for isotope separation, while the implantation chamber, which is vacuum-compatible, allows for both implanting ions into a substrate and monitoring dose uniformity. Other features found in the unit include a robust capacitively or inductively coupled plasma (CPI) source, which ensures stable and rapid implantation while also allowing for low-energy and single-ion implantation capabilities. VIISTA 3000 HP also comes equipped with a full range of peripherals, including a 1kV installation, a four-channel beam current transformer, a throttle valve, and an ion current monitor. It also includes a fully automated, robotic sample hander. All of these components work in conjunction to ensure repeatable and accurate implantation performance. VARIAN VIISta 3000HP sits at the forefront of implantation technologies, allowing for precise dopant control with user friendly and flexible machine capabilities. This advanced machine provides high-performance implantation with low energy, minimizing the damage from ion bombardment while maintaining high implantation rates. It also features an advanced control tool that offers user programmable recipes and parameter settings for automated processes. By utilizing the latest technology, VARIAN VIISTA 3000 HP offers one of the most reliable and consistent implantation systems available.
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