Used VARIAN VIISta 3000HP #9203292 for sale

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ID: 9203292
Wafer Size: 12"
Vintage: 2005
High energy implanter, 12" Energy range: 10 keV to 3750 keV Voltage divider Base system Power Distribution: 60 Hz Solid state: 0.75 MV D.C.Tandetron(TM) Accelerator provides: High output tandem NSI power supply ASME/TUV Certified accelerator pressure vessel VIISta single wafer processing end station with integral orientation control 0º- 360º at +/-1º accuracy Precise control of tilt angle combined with fast recipe controlled stepped tilt modes up to +/- 60º at An accuracy of +/- 0.1º Gas cooled electro-static platen Vertical scanning using linear servo motor driven Industrial air bearing Dual wafer capacity: 25 Polished load-locks with independent vacuum control Load lock: 300 mm Automatic pumping system includes: VARIAN Triscroll 300 dry pump for the air-bearing differential seals stage One Diaphragm roughing pump for the air bearing differential seals stage two Venturi pump for the air-bearing differential seals stage three (5) HELIX cryo pumps (3)400mm HELIX standard capacity cryo pumps on the process chambers (2) 250F HELIX high capacity cryo pumps located on beamline (2) PFEIFFER TMH-261 turbomolecular pumps for the end station load locks Turbomolecular pumping system consisting of: PFEIFFER TPH 2101 for the source (2) PFEIFFER TPH 2101 Pumps for the beamline locations Remote pump kit: To locate two cryo compressors DI water system Remote power distribution system includes Standard and included in base system: 15 meters Base system does not include roughing pumps VARIAN VIISta control system Microsoft windows NT(TM)/Windows 2000(TM) Multitasking operating system Next generation software control system monitoring over 3500 implant Equipment parameters for optimal system performance Automatic recipe set-up Optimization Control Production scheduling WIP Tracking System diagnostics Single wafer data logging HSMS SECS / GEM Compliant Multilevel password protected security system SPC Capability Small WIP buffer with 4 load ports Toxic gas box including: Standard inert gas module Exhaust connections from the top source (3) Standard process gas modules (3) manometers (2) exhausts (5) Gas modules plus Inerts (3) Plus Inerts are supplied as standard Long life indirectly heated cathode ion source Differentially pumped ion source chamber System S2-93 CE Compliance High voltage warning displays 3 Locations System signal tower Telemechanique (3) Lights: Green Amber Red Un-interruptible power supply (UPS) to support control system platen EMO Interlocked vesda smoke detection system Source exhaust flow interlock Integrated weight handling tools EMO Safety interlock Lead floor not required Required selects Standard power kit: UES Standard frequency kit: 60 Hz Facilities from top Signal tower: 3 Light standard RYG Standard gas box internal process / External purge Gas box exhaust from the top HP Ar / N2 DISS 718 HP BF3 DISS 642 SDS PH3 VCR 1/2" SDS AsH3 VCR 1/2" Standard on tool chiller Phase 2 IHC source without vaporizer HELIX standard cryo kit: 400 Standard polyflow cryo exhaust Customer supplied pumps to VSEA - Edwards iH-80 VSEA Supplied pfeiffer turbo pump kit Load lock vent standard finish Vent connection standard finish High voltage warning display Remote connection kit standard cryos: 15 Meters (3)Anometer gauges 0: 1kPa Monitors exhaust pressure of the main gas box Source shroud Rough pump Standard UPS V3000 Factory automation kit: Micron Includes indicator control kit E11134600 Hermos integration kit E11139470 Hokuyu E20000323 x 4 Vacuum connections from the bottom Thru-beam wafer mapping Installed Options: Wafer viewing and wafer Id SW - SEMI E58 ARAMS compliance HP BF3 DISS 642 Graphite kit metals reduction Service monitor PC Modification in 2009: V-Mask II upgrade kit Roplat: 300MM NCS Computer kit Modification in 2013: VIISta 3000 S/N ES154017 upgrade E11451460 2Ghz Control system UES NCS IAN Dose controller eprom kit for medium current implanters E11408090 for EHP dose contrllers E11436450 for XP/XPT Dose controllers reference PSB3312L EHP dose contrllrs PSB3651-XP/XPT dose contrllrs 2005 vintage.
VARIAN VIISta 3000HP is an advanced ion implanter equipment used for the implantation and analysis of ions in substrates such as semiconductor wafers or glass. This system is composed of several components that allow it to function with high precision. VARIAN VIISTA 3000 HP beam line begins with the ion source, where an ion beam is generated, manipulated, and focused. The ion source can be either a metal evaporator, a metal-oxide source such as titanium, zirconium, or barium, or a field-emission ion gun. After forming the initial beam, the beamline then passes through the beam optics components, including the mass analyzer and final aperture, for control of the beam as well as energy adjustment. VIISta 3000HP includes a variety of analysis and implantation chambers. The analysis chambers allow for isotope separation, while the implantation chamber, which is vacuum-compatible, allows for both implanting ions into a substrate and monitoring dose uniformity. Other features found in the unit include a robust capacitively or inductively coupled plasma (CPI) source, which ensures stable and rapid implantation while also allowing for low-energy and single-ion implantation capabilities. VIISTA 3000 HP also comes equipped with a full range of peripherals, including a 1kV installation, a four-channel beam current transformer, a throttle valve, and an ion current monitor. It also includes a fully automated, robotic sample hander. All of these components work in conjunction to ensure repeatable and accurate implantation performance. VARIAN VIISta 3000HP sits at the forefront of implantation technologies, allowing for precise dopant control with user friendly and flexible machine capabilities. This advanced machine provides high-performance implantation with low energy, minimizing the damage from ion bombardment while maintaining high implantation rates. It also features an advanced control tool that offers user programmable recipes and parameter settings for automated processes. By utilizing the latest technology, VARIAN VIISTA 3000 HP offers one of the most reliable and consistent implantation systems available.
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