Used VARIAN VIISta 3000HP #9210718 for sale
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ID: 9210718
Wafer Size: 8"
Vintage: 2005
Ion implanter, 8"
Main circuit breaker: 225 AMP
Maximum beam energy: 3,750 KeV
Exhaust flow rate: 21~24 m³/min
PCW:
Input: 60~ 100 PSIG 60~ 100 PSIG
Flow rate: 20 GPM
Input temperature: 16~19°C
Pressure:
N2: 55~100 PSIG
Ar: 50~100 PSIG
Air: 90~100 PSIG
Implant dose accuracy:
Dose range: 5E10 to 1E16 ions/cm²
Uniformity: 1s < 0.5%
Repeatability: 1s < 0.5% (Wafer-to-wafer, cassette-to-cassette)
Beam parallelism: < 0.5° in X & Y Axis
Ion mass resolution: M//DM > 80
Throughput: 250 wph
Wafer breakage: 1:100000
Process angles wafer tilt:
-60° to +60° Programmable in 1° steps
Accuracy: ±0.5°
-25° to +60° (Roplat)
Pumping line: Under roof
Source head type: Bernas
Wafer orientation: 0° to 360° (Programmable in 1° steps, accuracy ±2°)
Recipe-controlled stepped wafer rotation
Particulate control:
Front side: < 0.15 particles added/cm² at > 0.16mm particles
Vacuum pump:
Turbo pump: STP1003
Cryo pump 1: 250F
Cryo pump 2,3,4: 400
GAS Box:
Ar High pressure / Internal
AsH3 Cylinder type: SDS
PH3 Cylinder type: SDS
BF3 Cylinder type: SDS
Gas line purge
End station module:
Wafer handler platform type: Standard
Tilter type: Standard
Faraday type: Standard
Enclosure:
Signal tower
Smoke detectors
Vacuum system:
Source:
Turbo pump type: STP1003
Rough pump type: KASHIYAMA SDE 90
Beam line:
Analyzer turbo pump type: STP1003
Beamline turbo pump type: STP1003
Beam roughing pump type: KASHIYAMA SDE 90
Chamber:
Chamber hi-vac pump: Cryo pump
Cryo pump type: CTI 400
Cryo compressor type: CTI 9600
Loadlock Hi-vac pump: CTI400
Loadlock roughing pump: KASHIYAMA SDE 90
Includes manuals & drawing books
Power: 208 V, 50/60 Hz, 3 Phase, 60 A, 4/5W
2005 vintage.
VARIAN VIISta 3000HP is a versatile, high performance ion implanter and monitor for industrial applications. Featuring a robust and durable design, it is capable of providing a wide range of implant energies and fixed-gap parameters, enabling precise and controlled implantation of a variety of materials. VARIAN VIISTA 3000 HP utilizes a high voltage source to generate a plasma of ionized particles that are accelerated towards the sample material. The particle energy and flow rate is adjustable, allowing the user to precisely control the implantation energy and parameters. The monitor equipment utilizing advanced charge compensation techniques ensures that even low implant energies are accurately controlled and regulated. VIISta 3000HP has a wide range of features that enable reliable and repeatable implantation of materials for use in prototyping, dies, masks, and other industrial applications. It has a high capacity implanter that can accommodate large samples and substrates, with adjustable gap and pressure settings. The control system is highly programmable, allowing the user to perform operations in a number of ways, such as automatic or manual operation. VIISTA 3000 HP is equipped with two independent 10-channel digital read-outs for total dose and profile monitoring. This ensures that the implantation process can be monitored and adjusted during the implantation process if necessary. The vacuum capacitance and beam current feedback technique is used to compensate for instabilities in the beam to maintain a consistent dose and profile. VARIAN VIISta 3000HP is designed with maximum safety in mind, featuring an ion evacuation unit, emergency stop button and overload protection. The vacuum cleanliness machine ensures a low particle environment, while advanced anti-fouling and cleaning systems protect against impurities during operation. VARIAN VIISTA 3000 HP is a highly reliable and repeatable ion implanter and monitor, perfect for medium-to-high volume industrial applications. Its robust design and adjustable parameters make it an ideal choice for accurate and precise implantation processes.
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