Used VARIAN VIISta 80 HP #9055369 for sale

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ID: 9055369
Wafer Size: 12"
Vintage: 2004
High energy current ion implanter, 12" CE Marked Cassette Interface: (4) FOUP Small WIP Buffer (Single wafer processing end station w/wafer Orient Control) (Qty 2) 25-Wafer Loadlocks Energy Range: 200eV to 80keV IHC Ion Source Beam Energy Probe (for D1/D2 module control at 70/90° magnet regions) High Resolution 90° Analyzer Magnet 70° Magnet module Dual Plasma Xe Flood Gun 2D Profile Faraday Varian Positioning System (VPS): Recipe interlock incident angle control system Rotating Platen (X-Tilt capable from 0° to 60° +/-0.1° accuracy) Gas Cooled Electrostatic Platen Vertical Scanning Roplat Select Kit Facility Connections: Bottom Fed (air, water, power) Turbo Pumps/Cryogenics: (Qty 3) Helix /CTI 250 F On-board cryo pumps Beamline: Pfeiffer TMH2101 Source: Pfeiffer TMH2101 End Station/LLKs: (2) Varian 300-HT Varian Triscroll-300 Dry Pump Diaphragm Rough Pump (air-bearing diff. seals stage 2) Venturi Pump (air-bearing diff. seals stage 3) Remote Pump kit: 15M remote pump harness/helium lines Standard remote pump rack Gas Config: 1: Ar - HP (CGA 580, Praxair Specified) 2: BF3 - SDS (Unit MFC) 3: AsH3 - SDS (Praxair specified) 4: PH3 - SDS (Praxair specified) 5: SiF4 - HP (CGA 330) 6: CO2 - HP (CGA 320) 7: N2 - Maintenance Purge (Bulk ext feed) Affinity chiller VIISTA Varian Control System (VCS): Operating System: Win NT/2000 Auto receipt set up, optimization, control, production scheduling, WIP tracking, etc HSMS SECS / GEM Interface 12" SEMI Standards SW: includes E5, E30, E37, E37.1, E39, E40, E87, E90, E94 Power Requirements: 208V (50kVA), 175A, 3-Phase, 5-Wire, Freq 50/60Hz Power Dist. Schematic: E10144070 3KVA UPS (supports Control System & Platen) Safety: S2-93A compliant High voltage warning displays (5 locations) Source exhaust flow INTLK Lead floor radiation shield Hinged enclosure doors (interlocked) Status lamp (RYGB, INCDST, CE certified) UPS - control system and platen EMO interlocked Vesda smoke detection Exhaust (gas box, mech. pumps, cryo pumps) designed for thru-the-roof connections Included Options: Replaceable source liners Vaporizer and power supply Ar External purge assembly (slot 1, unit MFC) Inert process gas option for slot 7 Optional HP gas stick, unit MFCs Stainless steel UES exhaust Thru-beam wafer mapping SEMI E58 ARAMS compliance SEMI E84 Compliance V80 Factory automation kit Wafer Viewing (color video monitoring) 4-Pole GFI Option Kit (Main PD Only) Reduced brass kit Teflon toxic exhaust roughing line Grounding kit using star washers Customer supplied 50Hz freq converters for CTI cryos Currently stored in a warehouse 2004 vintage.
VARIAN VIISta 80 HP is a high-performance ion implanter and monitor designed for use in semiconductor production. It is capable of providing extremely accurate nanometer-scale implantations and is equipped with an advanced monitoring equipment for single-shot implantation. VARIAN VIISTA 80HP offers a wide range of implantation power and ions per batch, making it ideal for modern ion implantation processing. It features a state-of-the-art beam guidance system combined with high-precision ion optics to provide highly accurate scans that meet the needs of the most demanding implantation applications. This unit is also capable of adjustable implantation doses, enabling users to precisely tune the implant dose for each application. VIISta 80 HP also features deep implantation capabilities, allowing users to precisely control the implant depth to the nanometer scale. This advanced machine is capable of implanted depths up to 0.1µm, enabling users to achieve better homogeneity and improved device performance. In addition, VIISTA 80HP is equipped with a fast-acting arcing tool that minimizes arcing times making it suitable for high-throughput applications. This asset also features advanced monitoring capabilities which allow users to monitor the implantation process and ensure high quality and repeatability. VARIAN VIISta 80 HP has been designed to meet the needs of the most demanding production environments and is available with either an earlinerts or an EAS vacuum model. This sleek and compact equipment is also equipped with a self-diagnostic system which offers both remote and local service diagnostics, making it a very reliable implantation unit. Overall, VARIAN VIISTA 80HP is an ideal choice for semiconductor production due to its high-performance capabilities, deep implantations, adjustable implantation doses and monitoring capabilities. This advanced machine is designed for high-throughput applications and offers excellent implantation accuracy and repeatability.
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