Used VARIAN VIISta 80 HP #9308896 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9308896
Wafer Size: 12"
Vintage: 2005
Ion implanter, 12"
IAN Computer, P/N: E11130730
NCS Computer, P/N: E11083873
End station:
Platform type: UES Buffer, P/N: E11138370
(4) BROOKS AUTOMATION Fixload 6 Loadports
BROOKS AUTOMATION DBM 2706 Buffer robot
(2) BROOKS AUTOMATION VAC-407-2A PRI Robots, P/N: E40001450
Graphite type: Air bearing, P/N: E19282790
Driven side type: Y-Tilt
Cassette platform, 12"
Thru beam type: Wafer mapping
Wafer walkout sensor
Wafer orienter, P/N: E11320430
Cassette sensor present
Platen, P/N: E11368067
Roplat type: Tilter head P/N: E11313830
Light curtain
Standard load locks
PRI Robot
Signal tower
Scan harness
Process module controller
Transport module controller
Source module:
Gas box, P/N: E11140710
IHC Source head
Manipulator
Part number / Gas stick
E11116732 / Gas1 (Removed)
E11147261 / Gas2
E11147241 / Gas3
E11147251 / Gas4 (Removed)
E11116782 / Gas5
Beamline module:
70° Magnet PS
90° Magnet PS
Beamgate assembly, P/N: E11084141
Decel 1 PS
Decel 2 PS
Decel 1 suppression
Decel 2 suppression, P/N: E11326011
Quad 2 PS, P/N: E19283050
Ion source
Arc PS
Bias PS
Magnet PS
(2) Extraction PS
Extraction suppresion PS
70 and 90 Rod controller
Exhaust conductivity monitor
VESDA Smoke detector
Water leakage sensor
CVCF PD, P/N: E19009490
Process chamber module:
Angle cup, P/N: E11127951
Roplat kit
BROOKS AUTOMATION 354019-TD-T Vacuum gauge
(3) MKS 354019-TD-T Vacuum gauges
(2) EDWARDS STP-A2203C2 Turbo pumps
(1) EDWARDS SCU-1500 Source turbo pump controller
(1) EDWARDS SCU-1500 Beamline turbo pump controller
(2) PFEIFFER TMH-261 YPX Load lock pump
(3) GENESIS ICP 320 LQ Process chamber cryo
(2) GENESIS HC80 Cryo compressors
EDWARDS iQDP80 / QMB500 Endstation rough pump
EDWARDS iQDP80 / QMB500 Endstation diff pump
EDWARDS IGX100M Source rough pump
Main PD assy: Circuit breaker kit
Remote PD CVCF assy
HYNIX Remote rack
Lead floor
Service monitor
Bottom supply: Facilities and input power
Missing parts:
Controller mass flow, 0-3 SCCM, PH3, 4RA P/N: E23000350
Controller mass flow, N2 calibration 5 SCCM P/N: E23000101
AFFINITY PAA-003B-CE50CBD3 Platen chiller
(2) Manipulator controllers, P/N: E11290090
Advanced platen, P/N: E11368067
Dual PFG power supply controller assembly, P/N: E11092090
Quad lens, P/N: E11289020
Quad2 lens assy, P/N: E11320190
Isolation controller, P/N: E11106222
FILAMENT P/S, P/N: E19014140
LP2 ST32 Board, P/N: 013501-167-27
PFG Controller, P/N: E11092090
2005 vintage.
VARIAN VIISta 80 HP is a high-performance, multi-purpose ion implanter and monitor from VARIAN Semiconductor. This state-of-the-art equipment enables accurate and reliable implantation and monitoring of wafers during the ion implantation process. It is ideal for circuit and die production in the semiconductor industry. VARIAN VIISTA 80HP utilizes three integrated subsystems for precise implant control and monitoring: the ion implanter, the monitor and the controller. The ion implanter is a double-axis turntable-mounted system with an end-of-range detector. This unit is designed to provide precise implant dosage control by adjusting current, pulse width, and boost time. The monitor machine allows users to observe the ion flux during implantation. It uses a CMOS device to detect ion impingement on the wafer's surface and report the intensity of the ion beam. The controller is programmed to maintain consistent implantation parameters that ensures uniform implantation throughout each layer of the wafer. VIISta 80 HP is capable of running up to three ion guns at the same time which increases the throughput and improves implantation uniformity. The tool provides flexibility with its ability to manage different ionization energies simultaneously. This feature improves implant selectivity and reduces the chance of implant contamination. The asset features an anodic aluminum oxide (AAO) target support, blower equipment and gate head, and a sample holder that enable very low-damage implantation. VIISTA 80HP is suitable for many ion implantation applications, including connector contact implant, thin-film transistor memory, wafer joint for MEMS, MEMS pressure sensor applications, FET gate structure and oxide trench, and other high-precision profiles. It can also generate high ion current densities and current levels up to 80mA/cm2 with low adjustment times with its 200-stage linear feedback controller and high-speed wafer handling. This model is compliant with both single and multiple source operation. VARIAN VIISta 80 HP is an ideal equipment for reliable and affordable dye implantation and monitoring processes. Its cutting-edge features reduce work time and improve output quality and uniformity. This system is especially beneficial to companies seeking high-speed yet precise processing quality with superior consistency and cycle times.
There are no reviews yet