Used VARIAN VIISta 80 HP #9308896 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9308896
Wafer Size: 12"
Vintage: 2005
Ion implanter, 12" IAN Computer, P/N: E11130730 NCS Computer, P/N: E11083873 End station: Platform type: UES Buffer, P/N: E11138370 (4) BROOKS AUTOMATION Fixload 6 Loadports BROOKS AUTOMATION DBM 2706 Buffer robot (2) BROOKS AUTOMATION VAC-407-2A PRI Robots, P/N: E40001450 Graphite type: Air bearing, P/N: E19282790 Driven side type: Y-Tilt Cassette platform, 12" Thru beam type: Wafer mapping Wafer walkout sensor Wafer orienter, P/N: E11320430 Cassette sensor present Platen, P/N: E11368067 Roplat type: Tilter head P/N: E11313830 Light curtain Standard load locks PRI Robot Signal tower Scan harness Process module controller Transport module controller Source module: Gas box, P/N: E11140710 IHC Source head Manipulator Part number / Gas stick E11116732 / Gas1 (Removed) E11147261 / Gas2 E11147241 / Gas3 E11147251 / Gas4 (Removed) E11116782 / Gas5 Beamline module: 70° Magnet PS 90° Magnet PS Beamgate assembly, P/N: E11084141 Decel 1 PS Decel 2 PS Decel 1 suppression Decel 2 suppression, P/N: E11326011 Quad 2 PS, P/N: E19283050 Ion source Arc PS Bias PS Magnet PS (2) Extraction PS Extraction suppresion PS 70 and 90 Rod controller Exhaust conductivity monitor VESDA Smoke detector Water leakage sensor CVCF PD, P/N: E19009490 Process chamber module: Angle cup, P/N: E11127951 Roplat kit BROOKS AUTOMATION 354019-TD-T Vacuum gauge (3) MKS 354019-TD-T Vacuum gauges (2) EDWARDS STP-A2203C2 Turbo pumps (1) EDWARDS SCU-1500 Source turbo pump controller (1) EDWARDS SCU-1500 Beamline turbo pump controller (2) PFEIFFER TMH-261 YPX Load lock pump (3) GENESIS ICP 320 LQ Process chamber cryo (2) GENESIS HC80 Cryo compressors EDWARDS iQDP80 / QMB500 Endstation rough pump EDWARDS iQDP80 / QMB500 Endstation diff pump EDWARDS IGX100M Source rough pump Main PD assy: Circuit breaker kit Remote PD CVCF assy HYNIX Remote rack Lead floor Service monitor Bottom supply: Facilities and input power Missing parts: Controller mass flow, 0-3 SCCM, PH3, 4RA P/N: E23000350 Controller mass flow, N2 calibration 5 SCCM P/N: E23000101 AFFINITY PAA-003B-CE50CBD3 Platen chiller (2) Manipulator controllers, P/N: E11290090 Advanced platen, P/N: E11368067 Dual PFG power supply controller assembly, P/N: E11092090 Quad lens, P/N: E11289020 Quad2 lens assy, P/N: E11320190 Isolation controller, P/N: E11106222 FILAMENT P/S, P/N: E19014140 LP2 ST32 Board, P/N: 013501-167-27 PFG Controller, P/N: E11092090 2005 vintage.
VARIAN VIISta 80 HP is a high-performance, multi-purpose ion implanter and monitor from VARIAN Semiconductor. This state-of-the-art equipment enables accurate and reliable implantation and monitoring of wafers during the ion implantation process. It is ideal for circuit and die production in the semiconductor industry. VARIAN VIISTA 80HP utilizes three integrated subsystems for precise implant control and monitoring: the ion implanter, the monitor and the controller. The ion implanter is a double-axis turntable-mounted system with an end-of-range detector. This unit is designed to provide precise implant dosage control by adjusting current, pulse width, and boost time. The monitor machine allows users to observe the ion flux during implantation. It uses a CMOS device to detect ion impingement on the wafer's surface and report the intensity of the ion beam. The controller is programmed to maintain consistent implantation parameters that ensures uniform implantation throughout each layer of the wafer. VIISta 80 HP is capable of running up to three ion guns at the same time which increases the throughput and improves implantation uniformity. The tool provides flexibility with its ability to manage different ionization energies simultaneously. This feature improves implant selectivity and reduces the chance of implant contamination. The asset features an anodic aluminum oxide (AAO) target support, blower equipment and gate head, and a sample holder that enable very low-damage implantation. VIISTA 80HP is suitable for many ion implantation applications, including connector contact implant, thin-film transistor memory, wafer joint for MEMS, MEMS pressure sensor applications, FET gate structure and oxide trench, and other high-precision profiles. It can also generate high ion current densities and current levels up to 80mA/cm2 with low adjustment times with its 200-stage linear feedback controller and high-speed wafer handling. This model is compliant with both single and multiple source operation. VARIAN VIISta 80 HP is an ideal equipment for reliable and affordable dye implantation and monitoring processes. Its cutting-edge features reduce work time and improve output quality and uniformity. This system is especially beneficial to companies seeking high-speed yet precise processing quality with superior consistency and cycle times.
There are no reviews yet