Used VARIAN VIISta 80 #178078 for sale

Name: VARIAN VIISta 80
Brand: VARIAN
SKU: 178078
Availability: SoldOut

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Ion Implanters & Monitors

Manufacturer

VARIAN

Model

VIISta 80

ID: 178078

High current ion implanter, 8" Energy : 200eV to 80KeV Bernas Source with 5 Gas Stick - 90D Magnet Module and Gas Box Module Beam energy probe for D1 & D2 Module - 90 D Magnet Module and 70D Magnet Module High Resolution 90 D analyzer magnet - 90D analyzer magnet & Rods (10EA) 70 D magnet module providing uniformity & parallelism control, plus energy filtering - 70D Analyzer Magnet Multipoles(11EA) & Upper Rods(12EA), Low Rods(12EA) Profile Faraday to ensure uniform beam current distribution - Indirect Drive Profiler Assembly (Need to Upgarde, In-Vac Profiler or Rack and Pionion)- End Station Module Multiple Faraday systems for beam angle measurement & real-time monitoring - Dose Cup (Samping Cup) - End Station Module Recipe interlockable incident angle control system - End Station Module Dual plasma flood gun system - End Station Module Gas Box with 5 Gas Stick - Gas Box Module CES End-Station - End Station Module End station with orientation control 0~360 degree at +/- 1 degree accuracy - End Station Module Tilter-C Platen - End Station Module Precise control of tilt angle at +/- 0.1 degree accuracy - End Station Module - X tilt N2 Gas +Water Cooled electro-static platen , with 1KW or 2.4KW Chiller - End Station Module - Excluded Chiller Assembly only. Vertical scanning using linear servo motor driven, industrial air bearing - End Station Module Dual 25 wafer capacity, equipped for 200mm wafer sizer operations - End Station Module (3) CTI Cryo-Torr 8F cryo pump at process chamber - End Station Module (2) PFEIFFER TPH2101UPC DN 250 ISO-K, 3P - Source & Beamline Turbo Pump - Included 90D Magnet Module and 70D Magnet Module each. (2) Loadlock Turbopump - Varian 300HT and Pfeiffer - End Station Module (2) Alcatel ADS501 Roughing Pump - Source, Edwards Roughping Pump - E/S (2) Varian TriScroll Pump and Varian Membrane Pump - Included Tool Control Rack Module Module Division: Gas Box Module Facility Module -208V, 3P, 5W, 50KVA with UPS 90D Magnet Module 70D Magnet Module Source Control Module with Source Isolation Transformer Tool Control rack Module End Station Module Parts: 90D Waveguide 70D Waveguide Profiler Assembly Source Dry Pump - Alcatel: ADS501 E/S Dry Pump - Edwards Chiller Assembly (Affinity 1KW or 2.4 KW) D.I. Water Pump Assembly with Filter Service Monitor Assembly (2) Compressor Assembly (9600) (13) Door Assemblies (Right: 5EA, Left: 5EA, Rear:2EA, Inside Center: 1EA) Door Lead Panel Assemblies Roof Lead Panel Assemblies Roof Beam Assemblies Door Post Panel Assemblies (Frame) Roof Post Panel Assemblies (Frame) (2) CTI Cryo Pump - Excluded for cleaning the Chamber of E/S from E/S Module (2) Gate Valve and Housing - Excluded for cleaning the Chamber of E/S from E/S Module Lead Floor Assemblies D2 Lens Assembly Lelium Line MISC Parts (miscellaneous) Currently crated and stored in a warehouse 2000 vintage.

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VARIAN VIISta 80 is a state-of-the-art implanter and monitor that provides high accuracy and wide beam current range for ion implantation. This equipment provides exceptional implant uniformity and dose control. The product is suitable for a wide variety of production environments and suitable for the most demanding processes. VIISta 80 provides excellent beam current uniformity, wide dynamic range and low beam current ripple for optimal dose control. The beam current can be adjusted from very low to very high energies with a large dynamic range from 1 μA up to 200 mA. The high current resolution of 1 nA enables precise energy control for improved dose accuracy. VARIAN VIISta 80 features a high degree of flexibility, allowing for various combinations of beam-forming components. The system is capable of producing very uniform, extremely high current implants with low beam current ripple and low energy spread, enabling better precision control of implant dose. The flexible unit design also allows for easy customization of beam collimation and profile optimization. VIISta 80 utilizes a digital, feedback control machine to maintain optimum beam current accuracy and stability. This tool continually monitors and adjusts the beam current based on input from an external ion implant monitor. This asset also allows diagnostics, fine tuning, and automatic fault detection. VARIAN VIISta 80 combines the latest advancements in ion implantation with advanced electronics and a sophisticated, proven software package. The software package offers a comprehensive set of features, including experimental set-up, sample analysis and data logging, as well as control parameters for beam current and dose control and precision voltage setting. Overall, VIISta 80 is a powerful and reliable platform for both research and production implantation processes. The model features an excellent beam current uniformity, wide dynamic range and excellent current ripple, as well as a high degree of flexibility that allow for customized implantation profiles. The product also features an advanced feedback control equipment and sophisticated software for maximum accuracy, stability and precision.