Used VARIAN VIISta 80 #9127809 for sale
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ID: 9127809
Wafer Size: 8"
Vintage: 2001
Low energy high current ion implanter, 8"
CVCFpower kit, ViiSta 80
12" load lock N2 Vent Assy
Obs, signal tower asy, 4 lt, rpl by E11094871
Remove service monitor
Kit, dry pump, Ebara A10S, cust. supplied
On-board cryo 3, ES Vista-80 Kit
Kit, exhaust, roof, universal
Kit, chiller, Viista 80
Roughing kit, enstation, thru floor option
Kit, triple manometer, Viista 80
D-Buffer kit, Viista 80
Ion source assy
Facia kit, w/o buffer, white
Buffer kit, fixload w/ hermos
Rack assy, remove, Viista 80, w/ weld frame
Kit, turbo option, Pfeiffer 2101, Viista 80
Viewing & ID Assy, 12" wafer
Kit, pod placed, Brooks
Decel 2, Retrofit Kit
Pigtail, 4" Boron SDS, Slot 2
Pigtail, Argon/N2, high Pressure, Slot 1
Pigtail, HP, Position 3 & 5, 4 in Bottle
Pigtail, AS/PH3, SDS, Slot 3
Pigtail, AS/PH3, SDS, Slot 4
(4) Optical data transmission device, 8 bit
(3) Cable, power, on-board, 50' long
(4) Hose, flex, 3/4 ELB x STR, 15 meters long
Crated
2001 vintage.
VARIAN VIISta 80 is a high-performance ion implanter and monitor, specially designed for implantation of 30keV to 1.5MeV ions and detection of ions to 5MeV. It offers high throughput, accuracy, stability and safety for custom implantation and monitoring processes. The most remarkable feature of VIISta 80 is its large ceramic-based Linac which incorporates two two-plane deflectors for axial and radial beam steering. This allows it to pivot the beam through any angle, to a maximum angular deviation of 45°, so that most implantation needs can be met without the need for additional equipment. The device also boasts a 0.01mm resolution beam scanner, making it perfect for creating high-position accuracy and fine details of the targeted area. To ensure safety, VARIAN VIISta 80 employs a complete set of safety mechanisms, including current interlocks that prevent inadvertent beam start from its automated sequencing, and gate and airlock systems that allow for secure access. The device also uses ionizing radiation protection materials, such as lead, bronze, copper and stainless steel, to shield operators from high ion exposure levels. The device also features an electronic control system, which monitors the implanter's parameters including the Linac voltage and beam current, together with the load lock and gate controllers. This system helps ensure that the correct beam configuration is applied during the implantation process. Finally, VIISta 80 is extremely user-friendly, with intuitive graphical user interfaces and features for programming and controlling implantation sequences. The USB connectivity makes it easy for data management and communication with other computer systems. It is the ideal choice for high-precision ion implantation, from low energy materials to insulating substrates. With its exceptional features and capabilities, VARIAN VIISta 80 is one of the most reliable and accurate implantation and monitoring devices on the market.
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