Used VARIAN VIISta 80 #9159985 for sale
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ID: 9159985
Wafer Size: 8"
Vintage: 2000
High current ion implanter, 8"
Cassette interface:
(4) FOUPs
Small WIP buffer (Single wafer processing end station w/wafer orient control)
(2) 25-Wafer polished load locks
Energy range: 200eV to 80keV
IHC Ion source
Single filament bernas ion source
PFG Filament
Beam energy probe (For D1/D2 module control at 70/90° magnet regions)
High resolution 90° analyzer magnet
70° Magnet module
Dual plasma Xe flood gun
2D Profile Faraday
Varian positioning system (VPS): Recipe interlock incident angle control system
Rotating platen: X-Tilt capable from 0° t60° +/-0.1° accuracy
Gas cooled electrostatic platen
Vertical scanning
Replant select kit
Facility connections: Bottom fed (Air, water, power)
Turbo pumps / Cryogenics:
(3) Helix / CTI 250F On-board cryopumps
(1) Pfeiffer TMH2101 beamline
(1) Pfeiffer TMH2101 source
(2) Varian 300-HT end station / LLKs
(1) Varian triscroll-300 dry pump
(1) Diaphragm rough pump (Air-bearing diff. seals stage 2)
(1) Venturi pump (Air-bearing diff. seals stage 3)
Remote pump kit:
15M Remote pump harness / Helium lines
Standard remote pump rack
Gas Configuration:
Ar - HP (CGA 580, Praxair)
BF3 - SDS (Unit MFC)
AsH3 - SDS (Praxair)
PH3 - SDS (Praxair)
SiF4 - HP (CGA 330)
CO2 - HP (CGA 320)
N2 - Maintenance purge (Bulk ext feed)
Varian control system (VCS):
Operating system: Win NT / 2000
HSMS SECS / GEM Interface
300mm SEMI Standards SW: Includes E5, E30, E37, E37.1, E39, E40,E87, E90, E94
Power requirements: 208V (50kVA), 175A, 3-Phase, 5-Wire, Freq 50/60 Hz
Safety / Regulatory:
S2-93A Compliant
High voltage warning displays (5 Locations)
Source exhaust flow INTLK
Lead floor radiation shield
Hinged enclosure doors (interlocked)
Status lamp: RYGB, INCDST (CE certified)
UPS – Control system & Platen
EMO Interlocked vesda smoke detection
Exhaust: Gas box, mech pumps, cryo pumps
Installed options:
Replaceable source liners
Vaporizer & Power supply
Ar External purge assembly (slot 1, Unit MFC)
Inert process gas option for slot 7
HP Gas stick, Unit MFCs
Stainless steel UES exhaust
Beam wafer mapping
SEMI E58 ARAMS Compliance
SEMI E84 Compliance
V80 Factory automation kit (Infineon)
Wafer viewing, wafer ID (300mm Backside OCR semi M12 reader)
4-Pole GFI power kit
CE Marked line filter
Reduced brass kit
Teflon toxic exhaust roughing line
Grounding kit using star washers
2000 vintage.
VARIAN VIISta 80 is an ion implanter and monitor equipment manufactured by VARIAN Semiconductor Equipment Associates. This tool can be used for the implantation of dopants and maintanance of process control for semiconductor device manufacturing. VIISta 80 includes advanced features such as high acceleration voltages, wide beam currents, and advanced process control software. The system consists of a single- or dual-axis implanter, process monitor, and wafer handling mechanisms. The ion source is capable of implanting with a variety of dopants and producing a wide range of beam currents and energies. The beam current and energy can be controlled from the process monitor. Furthermore, the monitor allows for process control via sophisticated software. The single-axis model features an accuracy of 1V/um and a resolution of 0.7V/um. The dual-axis model has an accuracy of 0.7V/um and a resolution of 0.5V/um. VARIAN VIISta 80 also has a dose rate of up to 500mA-hr/min. It has the capacity to implant dopants such as boron, phosphorous, arsenic, and antimony. The unit is also capable of performing point, line, or spread implants. The implanter also has wafer handling abilities which include pre-align, high-speed robotic loading, single-piece transport, and protected atmosphere handling. This enables the machine to perform frequent, single-piece wafer transports. In addition, VIISta 80 also features an advanced air bearing to reduce total process time. In conclusion, VARIAN VIISta 80 is an advanced ion implanter and monitor tool. It is able to perform adjustable acceleration voltages, a wide assortment of beam current, and sophisticated process control software. This asset is also capable of implanting a variety of dopants and is equipped with wafer handling abilities. VIISta 80 is a useful tool to increase efficiency and accuracy during ion implantation in semiconductor device manufacturing.
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