Used VARIAN VIISta 80 #9203950 for sale

VARIAN VIISta 80 is a state-of-the-art technology in the field of ion implantation and monitoring. It is a high-performance implanter capable of delivering superior accuracy and throughput on a variety of wafer and substrate materials. It provides reliable ion implant parameters to create various semiconductor structures that serve as the basis of electronic components. VIISta 80 components include a Scannable Ion Source, Scanning Collimator, Pulsed Mode Detector, Laser Beam Profiler, Sensor System, Target Magnet, and High Voltage Power supply. The Scannable Ion Source is a tool that allows for the placement of different ions on a target material. It can be used to create semiconductor structures or modify an existing one. The Scanning Collimator uses focused magnetic and electrical fields to control the beam size and shape for precise implants. The Pulsed Mode Detector measures the neutron population coming out from the implanted material which in turn informs the implant parameters. It also provides data to adjust the high voltage for optimal energy input. The Laser Beam Profiler is a device that monitors the uniformity of the implanting ion beam. The sensor system is responsible for detecting changes on the surface of the substrate, while the Target Magnet is used for the collection and positioning of ions before implanting. Finally, the High Voltage Power supply delivers voltage for beam scans and performs implant operations in pulsed or continuous mode. It also offers protection against any potential implanting damage. Overall, VARIAN VIISta 80 provides a reliable and precise ion implant system. It is trusted to ensure the highest quality of the implanted material by giving precision implant control, improved throughput and accurate monitoring. This equipment is capable of creating high-performance and cost-effective electronic components.