Used VARIAN VIISta 80 #9262465 for sale

VARIAN VIISta 80 is an advanced ion implanter and monitor equipment that is designed to serve a variety of industry sectors, including the microelectronics and semiconductor sectors. The system consistently produces highly uniform and reliable ion implantations in a cost-effective manner. VIISta 80 features a four-axis, high-resolution motion control unit for accurate and precise manipulation of the ion source and substrate. This allows field-changing between a wide range of energy ranges and allows each implant to be tailored to the particular need of a particular material. For instance, low-energy implants are excellent for implantation into 4H-SiC, while high-energy implants are useful for semiconductors. The ion source of VARIAN VIISta 80 is a dual anode machine using Ar/O2 or Xe/O2 chemistry and can run up to 60kHz to provide very fast throughputs. The tool features DC power supplies that can be biased up to the desired implant energy - any energy up to two thousand volts can be achieved. Additionally, VIISta 80 features a high-precision beam modulation that allows the implant to be tuned to the size of the substrate with excellent precision. VARIAN VIISta 80 is also equipped with process monitoring and control systems that help ensure the accuracy and repeatability of an implant. These include real-time particle counting, real-time species analysis, computerized control of end-of-range dose, and real-time tracking of end-of-range dose. Additionally, the asset is designed to perform full process audit and diagnostic reports so that any necessary corrections can be made quickly and easily. Overall, VIISta 80 is an advanced ion implanter and monitor model that consistently provides accurate, uniform, and reliable implants in a cost-effective manner. By utilizing the latest technologies in monitor and control systems, VARIAN VIISta 80 operates safely and reliably in a wide range of applications, from general semiconductor fabrication to aerospace and automotive parts.