Used VARIAN VIISta 810 HP #9051773 for sale

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ID: 9051773
Vintage: 2003
Ion implanter Wafer Shape SNNF (Semi Notch No Flat) Wafer Cassette 8" Plastic Miraial SMIF Interface NO Power Distribution 208V 60Hz 75KVA 3phase Y-connection Control System 1GHz Computer Software Version Number V810hp 06 71 38 Gasbox1 Ar HP external supply Gasbox2 N/A (SDS) Gasbox3 ASH3 SDS Gasbox4 PH3 SDS Gasbox5 BF3 HP (6) Cryo pump CTI CT-250F (3) Cryo Compressor CTI 9600 (2) Ebara A10S Roughing Pumps (1) Varian triscroll300 Roughing Pump TMP Edwards STPH301C TMP2 Edwards STPH803C TMP3 varian HT-300 TMP4 varian HT-300 Ion Source Dual Filament Bernas type Dual Vaporizer Nothing Beam Reducer Nothing Platen E-CLAMP Beam Energy: 5-250keV (Signle charged Ion) 250-500keV (Double charged Ion) 500-750keV (Triple charged Ion) Auto Accel/Decel mode 208 V, 50/60 Hz, 3-Ph, 5-Wires, 35 kVA, 97 FLA 2003 vintage.
VARIAN VIISta 810 HP is a high performance ion implanter & monitor used for various process control and machine engineering applications. It is an advanced equipment, designed to precisely monitor and control various processes related to ion implantation. It allows manufacturers to maintain the highest levels of efficiency and accuracy, ensuring that the desired effects are achieved without the need of sacrificing quality or quantity. VARIAN VIISTA 810HP is an efficient and reliable tool for ion implantation, allowing the user to easily control a variety of parameters such as the implantation dose, beam spot size, and energy setting. It also features advanced functions, including rapid preprogramming with Multi-Process and Memory presets, real-time current capacity monitoring, and process automation for repeatable results. VIISta 810 HP is also known for its flexibility and robustness, enabling it to be used for a wide range of diverse applications, including the implantation of a variety of materials and the purification of various substrates. VIISTA 810HP also features excellent beam control and equipment monitoring, which allows users to ensure that operations are optimized. The beam control allows for precise implantation parameters, while the system monitoring capabilities provide a range of data such as implantation rate, beam Angle, voltage, current, and more. This comprehensive unit also includes a variety of safety features, which enable the user to ensure the utmost in safety and reliability. VARIAN VIISta 810 HP is a highly advanced ion implanter & monitor, offering the highest levels of accuracy, speed, flexibility, and safety. It is designed for a wide range of machine engineering and process control applications, providing reliable results in any operation. Its multiple process resolution, efficient monitoring, and advanced machine control make it an ideal solution for any environment.
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