Used VARIAN Viista 810 #193756 for sale
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ID: 193756
Wafer Size: 12"
Vintage: 2000
Medium current implanter, 12"
Specifications:
VIISTA 810 End Station (includes polished load lock chambers)
Standard power kit
(3) High voltage warning display
Tungsten Bernas gas ion source
Bernas source Dual vaporizer
Standard Gas Box, external inert purge
External Argon (position #1)
SDS BF3 gas card (UY Bottle) (position #2)
SDS Arsenic gas card (JY Bottle) (position #3)
SDS Phosphorus gas card (JY Bottle) (position #4)
Pigtail select
External inter purge gas facility
Minimized Gas mix manifold
Bottle adapters
Rotating Mass slit assembly
Water-cooled CTI 9600 Cryogenic compressors (2 each) onboard
Chiller unit for wafer chuck (R507 refrigerant)
Xenon Gas for PFS flood gun (Lecture bottle)
Scanning faraday
12" Wafer Chuck
Dose Processor Assembly
Dose Controller
Profiler Drive Assembly
VCS Computer system
Plasma Flood Gun Kit
Closed Loop Faraday assembly
Manometer kit, 3 readouts
Spectra RGA Hardware integration
PMS particle monitoring hardware integration
Varian control system software: Rev 03.03.0118
Configuration Software Viista 810 Rev M1 config 503
SECS / GEM communication capable
Cryo Pumps:
(3) CTI 250F for endstation
(1) CTI 250F for beam-line
Roughing Pumps:
(1) Edwards iQDP40 in HV Terminal
(1) Edwards iQDP80/QMB500 for endstation
(1) scroll pump for differential seals
Turbomolecular Pumps: Varian ICE turbo pump kit
V700 on the filter, V300 on the source
Vesda Smoke Alarm System, Model VLC-500 detector
Currently installed
2000 vintage.
VARIAN Vista 810 is a high performance ion implanter and monitor for precise and reliable implantation of ions into substrates. It provides advanced technology to achieve the most accurate and precise implantation of ions for a wide range of applications. The Vista 810 utilizes a customized scan equipment to ensure scan uniformity and accuracy, ensuring superior implantation quality. The Vista 810 can handle a wide range of implant applications. Its impressive beam uniformity and accuracy make it ideal for use in advanced semiconductor process development or production. This system is designed to take advantage of other VARIAN ion implanter technologies including magnetically confined ion beams, collimated ion beams, and particle beam scanning. The Vista 810 features an advanced ultra-high voltage ion source that delivers a wide range of ion species at various energies. This source provides much higher implantation accuracy than traditional sources. The unit also includes an advanced ion beam profile monitor to measure the position of the ions as they are being implanted. This monitor allows for the rapid detection of any distortions in the beam profile. The Vista 810 also supports a range of other features designed to enhance the implant process. The machine allows for the implementation of different beam line configurations including the use of additional elements such as variable apertures and optical components to achieve optimized experiments. The Vista 810 is also equipped with advanced data collection and analysis capabilities. This can help to accurately characterize the implant profile for various materials, enabling enhanced performance. Overall, the Vista 810 is an advanced ion implanter and monitor designed to provide superior implantation accuracy and uniformity. Its range of features and capabilities make it ideal for use in advanced semiconductor and production processes. With its advanced scan tool, high-voltage ion source, and data collection and analysis capabilities, the Vista 810 provides reliable implantation and monitoring for a wide range of implant applications.
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