Used VARIAN Viista 810 #62638 for sale
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ID: 62638
Medium current ion implanter, 8"
CE Marked
Energy Range: 5 – 810 keV
Dose Range: 1xe11 – 1xe16
Programmable Tilt Angle: +/- 60deg
Source Type: IHC Source Tungsten
Cassette Interface:
2 Bolt-On Asyst LPT-2200
PRI Robot Handler
Chuck Type: Gas Cooled ESC (Composite Platen)
Options:
Low Energy upgrade
Thru Beam Wafer Mapping system
DELL Server (IAN)
VESDA Smoke Detector system (Laser Plus)
GEM / SECS
Std Network Comm. Capability
End Station Cryo Pumps:
Process Chamber: 3 Brooks/Helix OB-250F
Scan Chamber: Brooks/Helix OB-250F
Turbo Pumps:
Source Turbo: Pfeiffer TPH 521 YP without Gate Valve Service PC
Beam Line Turbo: Pfeiffer TPH 521 YP
Left Load-Lock: Pfeiffer TPH 521 YP
Right Load-Lock: Varian V300C
Gas Configuration:
AsH3 - SDS
PH3 - SDS
BF3 - SDS
Ar (N2) - HP
XE (N2) - HP
Software:
NCS / IAN: Win2k pro
VCS: v 6.70 SP3
V 208, 3-Phase, Freq 50Hz
2001 vintage.
VARIAN Viista 810 is an integrated ion implanter and monitor. Developed by the leaders in ion implant technology, VARIAN, and backed by over 60 years' experience in this highly specialized sector, Viista 810 offers enhanced capabilities in the critical area of ion implantation and monitoring. At its core, the 810 is a high-performance ion implanter. It is able to implant multiple species and energies with extraordinary precision in a wide range of materials, creating significantly higher throughput than ever before. Through the use of highly focused beams, accelerated voltages and advanced optics, the 810 offers a higher range of control and accuracy when compared to other machines in the market. Additionally, the 810 can implant up to 40 ions per second with a total current load of up to 400 milliamps. Where VARIAN Viista 810 really excels, however, is its impressive monitoring capabilities. This machine utilizes an in-situ beam optical emission spectroscopy (IOES) sensor to measure the energy of Ions and other beam characteristics with real-time performance. This level of control allows VARIAN to develop and implement an advanced control algorithm, guaranteeing the uniformity and reproducibility of the implant layer. Furthermore, the 810 comes equipped with a state of the art altitude control system. By extending the maximum acceleration voltage up to 30 kV, Viista 810 guarantees constant beam angle control, enabling higher accuracy with rotational tracking - even at high angles of inclination. This cutting-edge system also offers enhanced safety during implantation with auto shut-off if dangerous beam conditions are detected. This helps reduce the risk of human errors and significantly improve production effectiveness and quality. In summary, VARIAN Viista 810 is an integrated ion implanter and monitor that offers enhanced control and precision when compared to other models in the market. It offers an unprecedented level of control with its in-situ beam optical emission spectroscopy sensor and its auto shut-off safety feature that ultimately helps reduce the risk of human errors during implantations.
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