Used VARIAN Viista 810 #9191583 for sale
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ID: 9191583
Wafer Size: 12"
Vintage: 2008
Medium current ion implanter, 12"
Parts machine
Standard power kit
High voltage warning display (X3)
Tungsten bernas gas ion source
Bernas source dual vaporizer
Standard gas box
External inert purge
Polished load lock chamber
Dosing performance:
Range: 1E11-1E16 ions/cm2
Uniformity: ≤ 0.5% (for implant energies > 5 keV)
Repeatability: ≤ 0.5% (wfr-to-wfr, cassette-to-cassette)
Implant angles:
Tilter: ± 60°in X and Y
Orientation: 0 - 360°
Rotation: Equivalent multi-tilt, quad mode
Angle control accuracy and repeatability:
Beam parallelism: ± 0.1°
X & Y-tilter: ± 0.1°
Orientation: ± 1.0°
Wafer cooling:
200 mm: ≤100°C @ 800W Beam power
300 mm: ≤100°C @ 900W Beam power
Particles: <0.05/cm2 (mean value) for particle size > 0.16µm
Metals contamination:
Heavy metals: ≤ 5 ppm (TXRF)
Aluminum: ≤ 5 ppm (SIMS)
Implant condition: 80keV, 1e16/cm2
Ion mass resolution:
Energy > 5 kV, M/ΔM = 30
Energy > 20kV, M/ΔM = 50
Energy > 80kV, M/ΔM = 85
Mechanical throughput:
200 mm: > 270 WPH
300 mm: > 250 WPH (with buffer and 25 wafer cassette, Steady-state)
2008 vintage.
VARIAN Viista 810 ion implanter and monitor is a cutting-edge piece of machinery designed to precisely implant ions into a material. This advanced device features patented technology to perform efficient implantation rates while allowing users to monitor the progress while the implantation is taking place. Viista 810 uses a modern RF ion source to implant ions into the material. This device is capable of implanting ions of various sizes and compositions with a great degree of precision. It also features a highly advanced Automated VAFS™ system that allows the user to specify a desired implantation rate. VARIAN Viista 810 uses an advanced ion beam optimization technology to adjust the ions trajectory in three-dimensional space for optimum accuracy of the implantation. This drastically reduces the number of implantations required for a desired result. Another key feature of Viista 810 is the low-angle scatter suppression technology, which reduces the amount of radiation that is scattered from the implantation site. This helps to drastically reduce the risk of human exposure to ionizing radiation. VARIAN Viista 810 also features an advanced monochromator that allows the user to separate ions according to their energy spectra. This ensures that only desired ions are implanted into the material, helping to further improve accuracy and cost efficiency. The advanced graphics user interface of the device also allows users to monitor the progress of the implantation process in real-time. The device includes a variety of different safety measures, including an automatic shut-off feature that activates if the device overheats. This helps to ensure optimum safety when using the device. Overall, Viista 810 is an advanced and highly efficient ion implanter and monitor. It features a variety of features and technologies designed to increase accuracy and cost effectiveness of the implantation process while reducing the risks associated with radiation exposure.
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