Used VARIAN Viista 810 #9256809 for sale

VARIAN Viista 810 is an ion implantation and monitoring equipment designed to provide high productivity in semiconductor fabrication, while maintaining product quality and reliability. This system is capable of implanting a wide range of species, including arsenic, boron, and others. With its advanced design and high power capabilities, Viista 810 ion implanter offers superior performance with lower cost and complexity. The unit consists of several key components: an accelerating chamber, a mass analyzer, a vacuuming machine, and a beammonitor. The accelerating chamber is a vacuum chamber made of stainless steel, with a powerful electromagnet that is used to accelerate the ions to the desired energy level. The mass analyzer is an ion spectrometer that is used to sort the ions by mass so that they can be implanted with the correct atom ratio. The vacuuming tool is used to ensure constant pressure and cleanliness within the asset, while the beammonitor allows the operator to control the shape, size, and position of the ion beam. VARIAN advanced ion implantation technology is designed to provide high productivity while maintaining excellent process control. The model is equipped with an advanced distributed control architecture for optimum productivity and excellent process stability. It has a fast load lock equipment and efficient wafer transfer system for increased productivity. The unit also includes a state-of-the-art ion beam monitor that provides real-time monitoring of beam parameters. VARIAN Viista 810 has been designed with a modular and scalable architecture, allowing for greater flexibility and cost savings. The machine is available in several sizes to provide different levels of throughput and process capabilities. It has a compact footprint and streamlined construction, which makes it simple to install and maintain. Viista 810 is well suited for use in production and R&D settings, allowing users to switch quickly among process parameters. Through its advanced monitoring and control features, the tool ensures product quality and reliability. With its low power consumption, the asset also offers cost savings by reducing total cycle time and increasing yield. It is one of the most reliable and cost-efficient solutions for ion implantation and monitoring.