Used VARIAN Viista 810 #9411062 for sale

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ID: 9411062
Wafer Size: 8"
Vintage: 2004
Implanter, 8" Terminal PD With ESC Platen Gas box Module: Control Accel tube Terminal Beam line Control system End station Process chamber DI Cart Accel stack assembly Air bearing assembly Source region PFG assembly PC.
VARIAN Vista 810 is a highly reliable, advanced ion implanter and monitor equipment dedicated to meeting a wide range of process requirements in semiconductor device fabrication. It features a totally customizable solution with a high degree of process flexibility to meet specific customer requirements. When prototyping, Vista 810 facilitates rapid and reliable characterization and integration of complex processes to support full product qualification flow. It is built on the well-known VARIAN type 810 architecture, which has been tested and proven over the years; its intuitive user-interface and intuitive graphical tools enable it to be easily operated and maintained. The Vista 810 features two types of ion implanters; the traditional medium-current implanter, commonly referred to as the DC implanter, and the advanced high-current implanter, also known as an AC implanter. The medium current implanters have a standard resolution of 0.1 μm, which can be modified with optional image-correcting components. The ability to precisely control doping profiles is supported by patented magnetic septum technology. The Vista 810 enables the highest-best-of-class ion uniformity available in any implantation system. The advanced high-current implanter provides maximum flexibility through a small beam focused on a large area to implant large substrates. It also offers tight process control, resulting in rapid cycle times and precise ion uniformity over the entire substrate. The eight-zone beam unit ensures fast and accurate beam tracking for efficient implantation. The Vista 810 also comes with an advanced ADIStab monitor and stimulator machine that simultaneously detects and shapes influences from the process environment. The tool is able to both detect and control unintended process variables through precise, time-driven and energy-neutral monitoring and stimulus functions, providing precise and reliable process control. The asset is designed for precise and efficient implantation in semiconductor fabrication processes, and it comes with a variety of processes, controls and analysis tools for precise operation. The model also offers process security monitoring, ensuring that the right combination of parameters is maintained to achieve optimal results. The Vista 810 serves as a reliable tool to simulate, analyze and optimize implant processes, while providing precise and precise results with uncompromising reliability.
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