Used VARIAN VIISta 810EHP #9096214 for sale

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ID: 9096214
Wafer Size: 12"
Vintage: 2004
Medium current implanter, 12" End station Beamline module Terminal Buffer station Service PC Door cart Post cart Roof cart Main PD cart DI cart Chiller Profiler Accel column Floor panel Remote rack Remote cable 2004 vintage.
VARIAN VIISta 810EHP is a high-performance ion implanter and monitor for the world's most advanced semiconductor device fabrication processes. The 810EHP combines high productivity and precision with the latest in MEMS, SOI, and advanced CMOS technologies. The 810EHP provides a fully automated 'Closed Loop Implantation' equipment, allowing users to actively monitor and control the implant process for increased accuracy and production consistency. The system is able to rapidly adjust the beam energy and dose, giving users greater control over implant characteristics such as path length, side-wall angle, and dopant profile. The 810EHP features a sophisticated, multi-zone, single magnet power supply and high-efficiency beam scanner, providing precise implant control. The eight-zone scanner gives the unit added speed and flexibility. The 810EHP also features advanced real-time analysis capabilities, allowing operators to adjust beam stability and dose during implant operations. The integrated, high-resolution, digital slit imaging generator allows operators to monitor and control the implant angle during implantation, which is important for achieving the desired dopant profiles. The 810EHP is capable of producing a consistent, precise, and repeatable implant profile with a uniform dose. The 810EHP is designed to meet the demanding requirements of high-volume, high-speed production. It features a powerful, quiet cooling machine and a heavy-duty power supply with a long-term operational stability for high temperature and duty cycles. The 810EHP is also equipped with a rugged 11-position wafer cassette, with a reliable load/unload mechanism and adjustable cassette speed for faster throughput. The 810EHP is a high-performance ion implanter and monitor with increased accuracy, production consistency, and control for advanced semiconductor device fabrication processes. The integrated, multi-zone power supply and advanced digital slit imaging generator provide precision, stability, and repeatability. The 810EHP is designed for high-volume, high-speed production, with a powerful, quiet cooling tool and heavy-duty power supply, convenient wafer cassette, and rapid load/unload mechanism for faster throughput.
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