Used VARIAN VIISta 810Xer #9215997 for sale

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ID: 9215997
Wafer Size: 12"
Medium current ion implanter, 12" Control: IAN Computer (6A51) E11130730 NCS Computer (6A52) E11083873 VEST Computer (6A69) Old type Hardware configuration: Cryo pump: (4) CTI-320F CTI-250F Compressor: (2) IS-1000 TP1: BOC EDWARDS 800 Liters TP2: BOC EDWARDS 800 Liters Source dry pump: ESR20N ES Rough pump: EST100WN Diff pump: Scroll pump Source: IHC Gasbox: N2 HP 5sccm BF3 SDS 5sccm AsH3 SDS 5sccm PH3 SDS 5sccm N2 HP 5sccm N2 HP 5sccm Facilities: Main PD: CVCF Gasbox exhaust RP2 Exhaust Chiller NasLab Roof fans: No Pfg xenon gas Di Cart: Near tool control rack ES: Elevator: Without brake Profiler: Rack and pinion Tilter BROOKS Buffer robot LP TAS300 Plus Maximum energy: 900 KEV.
VARIAN VIISta 810Xer is a cutting-edge ion implanter and monitoring equipment which offers excellent control of the ion-implant process, enabling users to easily create cutting-edge technologies. It is designed for use in semiconductor and MEMS fabrication processes, providing high accuracy and repeatability in the ion-implanting process. The system is powered by an advanced ion source with a wide range of adjustable parameters, including beam current, energy level, spot size and other parameters. This allows users to easily adjust the ion-implanting process to create technologies that meet their exact requirements. Additionally, it is equipped with an ion detector which is sensitive up to 10A of current, providing excellent accuracy in the monitoring of the process. The unit features an intuitive user interface, enabling users to easily monitor and control the operation from a single screen. In addition, the machine includes a real-time data acquisition tool which enables users to optimize their implant parameters without having to manually adjust the parameters. Moreover, it also features a comprehensive graphical user interface, allowing users to visualize the implantation process on a single screen. The asset is designed for maximum efficiency and dependability. It features an innovative low-pressure implant chamber with wide temperature range compatibility, allowing users to perform implantations at a wide range of temperatures without performance loss. Additionally, the model offers a comprehensive equipment diagnostics suite, enabling users to quickly identify and troubleshoot any component failures. VARIAN VIISTA 810 XER is a top-of-the-line ion implanter and monitoring system, offering outstanding accuracy and reliable performance. With its advanced ion source and integrated monitoring unit, it is ideal for semiconductor and MEMS fabrication processes, providing exceptional control of the ion implant process.
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