Used VARIAN VIISTa 810XP #9111170 for sale

VARIAN VIISTa 810XP is an advanced ion implanter and monitor for semiconductor device fabrication. It is the latest in VARIAN line of advanced ion implanters and monitors, and uses advanced technologies to deliver higher precision implantation and monitoring. The 810XP has a wide range of ion implantation capabilities, with ion beam energy levels ranging from 1 KeV to 2 Megaelectronvolts (MeV). It can also perform ionizing defects, surface treatments, and implantation-induced topography reductions. It can also accommodate a wide variety of implant recipes; from low to high-energy doses, fast to slow dose rates, and high dose rates with negative beam smoothing. The 810XP also features an advanced beam monitor that is capable of monitoring beam intensity, beam uniformity, and stability. It can adjust the beam's alignments, spot size, pulse width and frequency. This allows users to precisely set and monitor dose and time parameters to ensure the highest-quality implants. The 810XP has an intuitive user interface that enables users to quickly set up and manage implant recipes. It can be equipped with an optional system controller for fast and precise implant recipes. The system controller can also provide real-time data analytics to improve implant performance. Overall, VARIAN VIISTA 810 XP is an advanced ion implanter and monitor that is capable of delivering precise and reliable implantation results. Its wide range of implantation capabilities, advanced beam monitor, and intuitive user interface make it an ideal choice for semiconductor device fabrication.