Used VARIAN VIISTa 810XP #9111183 for sale

VARIAN VIISTa 810XP is an ion implanter and monitor used for the fabrication of semiconductors. It utilizes an ion beam to selectively remove or deposit impurities from the wafer surface in order to alter its electrical properties. The implanter also provides metrology sensors, diagnostics systems and inertial measurement units (IMUs).VARIAN VIISTA 810 XP is designed to handle a wide range of operations including surface analysis, implantation, and measurement activities. The 810XP's source power equipment is capable of up to 30kV, 5A and up to 7200Amin without heater tripping, allowing it to achieve high energy densities and adjustable pulse widths. The ion source consists of a linear ion source, an ion extraction grid, and an ion optical system that allows ions to be focused and scanned across the wafer surface. The implanter also includes a beam monitoring unit for real-time control of the particle beam. VIISTa 810XP can be equipped with a range of programs, including implant temperature control, spot, sector, line, and polygon modes, as well as predetermined paths, providing users with the highest throughput and precision. Additionally, the machine contains a thin film deposition chamber which is capable of depositing thin films on wafers. This feature allows users to add or remove impurities for device tuning and layer engineering. To operate VIISTA 810 XP, the user can either prefer to use their own proprietary software or VARIAN WinNT-based Windows 2000 compatible software. The software is designed to provide real-time graphical displays of the implanted feature, dose, energy, and range as well as a database that stores exact data required to repeat an implant later on. VARIAN VIISTa 810XP is a high-precision implanter and monitor, suitable for use in a range of fabrication environments. It provides excellent beam control and accuracy plus a range of features designed to achieve the highest throughput and precision. The ion source generates a high-power beam and is capable of adjusting the pulse widths and energy densities. Additionally, the thin film deposition chamber allows for precise layer engineering and wafer tuning. The WinNT-based Windows 2000 compatible software provides real-time graphical displays and a database for storing implant data. This makes VARIAN VIISTA 810 XP an ideal addition to any semiconductor fabrication facility.