Used VARIAN VIISta HCP+ #293650710 for sale

VARIAN VIISta HCP+ is a high capacity production ion implanter and monitor designed to meet the needs of today's integrated circuit industry. Using a compact, low-vacuum, linear accelerator-like design, VIISta HCP+ is well-suited to high-volume device production. It has been designed to provide best-in-class process control, with advanced monitoring and control systems that enable implantation of closely-spaced and variable depth implantations. The HCP+ equipment consists of a filament, ion source and ion amplifier components, a three electrode acceleration system, as well as a monitor and control unit. A single uniform energy beam is produced by the ion source, which is then amplified and accelerated by the three electrodes, with the voltage adjustable to any energy within the range. The monitor and control machine allows operators to precisely predict and control the energy of the implants to a very fine degree, while also providing diagnostic capability to ensure complete process control and repeatability. Variable beam control permits users to optimize beam current and spot size to match their process needs. VARIAN HCP+ is an exceptionally versatile platform that can be used for wafer etching, ion implantation and even nanosurgery. It has high beam current, wide dome energy (produces implants of various depths) and can control beam scan patterns for multiple energized implants. The HCP+ was designed to support production of advanced ICs, and its advanced monitoring and control tool allows it to accurately produce high-volume, consistently uniform implants. This asset offers unsurpassed flexibility, allowing users to quickly adjust implant instructions and monitor performance in real time. It is an ideal choice for a range of IC production processes and offers an unrivaled cost:performance ratio that is ideal for cost-conscious high-volume production environments.