Used VARIAN VIISta MC80 #9282294 for sale

VARIAN VIISta MC80 is an ion implanter and ion monitor from VARIAN Semiconductor Equipment Associates, Inc. (VSEI). This equipment is designed for use in the implantation and monitoring of semiconductor and MEMS components. The system utilizes an 80kV tandem accelerator to create a high energy beam of ions. This beam of ions is focused by the accelerator's multiple electrostatic lenses and manipulated by multiple deflectors into the desired beam size and shape. The unit is controlled by a user interface that allows for individual component parameters to be set and monitored. VIISta MC80 is equipped with a range of beam current monitors that record the beam current, beam shape and size, and spot sizes of rectangular and circular beams. This allows for precision control of the parameters of the beam and increases accuracy when implanting components. Additionally, the machine contains a wide range of safety measures, such as a beam limiter, to ensure no damage is done to components. VARIAN VIISta MC80 can be used to implant wide range of materials, from boron and arsenic to phosphorous and silicon. Moreover, using the range of beam current monitors in conjunction with the appropriate computer programs, both the type of material implanted as well as the desired dose can be accurately controlled. Furthermore, this tool can monitor the status of the implant in real time and detect any issues before they become a problem. VIISta MC80 is capable of working at high throughput with the automated wafer transfer mechanism, meaning that it can process up to 200 wafers per hour. It has low contamination levels as a result of the air cleanliness that can be achieved in the implanter chamber, meaning that it results in a high yield for the components being processed. VARIAN VIISta MC80 is a reliable asset capable of consistently delivering high quality results. It offers a wide range of options to suit different used, making it suitable for implantation of a range of components and materials. The model is user-friendly, and is capable of running for long periods of time without any problems or interventions. It is an excellent choice for both creating and monitoring implants used in semiconductor and MEMS industry.