Used VARIAN VIISta PLAD #9262785 for sale

VARIAN VIISta Plasma Implante rand Monitor is a versatile and powerful ion implanter and monitor used in the field of semiconductor integrated circuit fabrication. It is capable of implanting ions into substrates with high accuracy and precision, as well as monitoring implanting parameters (such as beam current, voltage, and dose) with state-of-the-art in situ diagnostics. VARIAN VIISta is equipped with a five-axis coordinate stage of motion, enabling high precision beam alignment and continuous processing of wafers and other substrates. A private sector software package allows precise control of beam settings, allowing users to customize the process depending on the type of semiconductor device being made. Additionally, VARIAN VIISta features a 10 target plasma generator, allowing for a wide range of ion species to be implante d. Advanced ion diagnostics are integrated directly into the machine, including a multi-target desorption force analyzer, which allows accurate monitoring of dopant concentration and energy depth distribution. Additionally, an energy spread analyzer provides highly detailed energy spectra. This advanced monitoring system allows users to obtain feedback on their implant parameters and enables optimization and modification in order to achieve precise control over the ion implanting process. Together with its excimer laser source, VARIAN VIISta is an extremely efficient tool for sophisticated ion implanting, allowing for unprecedented accuracy and repeatability in the fabrication process. Its suite of advanced diagnostics and software control allow users to fine-tune the ion implanting process in semiconductor device fabrication. It provides an effective platform for developers to optimize their process for improved speed, accuracy, and yield.